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"kao kuo hsing"的相关文件
显示项目 11-28 / 28 (共1页)
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| 國立交通大學 |
2017-04-21T06:48:53Z |
Fluorinated HfO2 Gate Dielectrics Engineering for CMOS by pre- and post-CF4 Plasma Passivation
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Wu, Woei-Chemg; Lai, Chao-Sung; Lee, Shih-Ching; Ma, Ming-Wen; Chao, Tien-Sheng; Wang, Jer-Chyi; Hsu, Chih-Wei; Chou, Pai-Chi; Chen, Jian-Hao; Kao, Kuo-Hsing; Lo, Wen-Cheng; Lu, Tsung-Yi; Tay, Li-Lin; Rowell, Nelson |
| 國立交通大學 |
2017-04-21T06:48:19Z |
Diamond-shaped Ge and Ge0.9Si0.1 Gate-All-Around Nanowire FETs with Four {111} Facets by Dry Etch Technology
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Lee, Yao-Jen; Hou, Fu-Ju; Chuang, Shang-Shiun; Hsueh, Fu-Kuo; Kao, Kuo-Hsing; Sung, Po-Jung; Yuan, Wei-You; Yao, Jay-Yi; Lu, Yu-Chi; Lin, Kun-Lin; Wu, Chien-Ting; Chen, Hisu-Chih; Chen, Bo-Yuan; Huang, Guo-Wei; Chen, Henry J. H.; Li, Jiun-Yun; Li, Yiming; Samukawa, Seiji; Chao, Tien-Sheng; Tseng, Tseung-Yuen; Wu, Wen-Fa; Hou, Tuo-Hung; Yeh, Wen-Kuan |
| 國立交通大學 |
2017-04-21T06:48:19Z |
High Performance Poly Si Junctionless Transistors with Sub-5nm Conformally Doped Layers by Molecular Monolayer Doping and Microwave Incorporating CO2 Laser Annealing for 3D Stacked ICs Applications
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Lee, Yao-Jen; Cho, Ta-Chun; Sung, Po-Jung; Kao, Kuo-Hsing; Hsueh, Fu-Kuo; Hou, Fu-Ju; Chen, Po-Cheng; Chen, Hsiu-Chih; Wu, Chien-Ting; Hsu, Shu-Han; Chen, Yi-Ju; Huang, Yao-Ming; Hou, Yun-Fang; Huang, Wen-Hsien; Yang, Chih-Chao; Chen, Bo-Yuan; Lin, Kun-Lin; Chen, Min-Cheng; Shen, Chang-Hong; Huang, Guo-Wei; Huang, Kun-Ping; Current, Michael I.; Li, Yiming; Samukawa, Seiji; Wu, Wen-Fa; Shieh, Jia-Min; Chao, Tien-Sheng; Yeh, Wen-Kuan |
| 國立交通大學 |
2015-12-02T02:59:37Z |
Impacts of the Shell Doping Profile on the Electrical Characteristics of Junctionless FETs
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Kumar, Malkundi Puttaveerappa Vijay; Hu, Chia-Ying; Kao, Kuo-Hsing; Lee, Yao-Jen; Chao, Tien-Sheng |
| 國立成功大學 |
2015-11 |
Impacts of the Shell Doping Profile on the Electrical Characteristics of Junctionless FETs
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Kumar, Malkundi Puttaveerappa Vijay; Hu, Chia-Ying; Kao, Kuo-Hsing; Lee, Yao-Jen; Chao, Tien-Sheng |
| 國立交通大學 |
2014-12-08T15:44:27Z |
Improvement on performance and reliability of TaN/HfO2 LTPS-TFTs with fluorine implantation
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Ma, Ming-Wen; Chen, Chih-Yang; Su, Chun-Jung; Wu, Woei-Cherng; Yang, Tsung-Yu; Kao, Kuo-Hsing; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:15:57Z |
Fringing electric field effect on 65-nm-node fully depleted silicon-on-insulator devices
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Ma, Ming-Wen; Chao, Tien-Sheng; Kao, Kuo-Hsing; Huang, Jyun-Siang; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:15:32Z |
High-kappa material sidewall with source/drain-to-gate non-overlapped structure for low standby power applications
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Ma, Ming-Wen; Chao, Tien-Sheng; Kao, Kuo-Hsing; Huang, Jyun-Siang; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:14:34Z |
Impact of high-k offset spacer in 65-nm node SOI devices
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Ma, Ming-Wen; Wu, Chien-Hung; Yang, Tsung-Yu; Kao, Kuo-Hsing; Wu, Woei-Cherng; Wang, Shui-Jinn; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:12:40Z |
Characteristics of PBTI and hot carrier stress for LTPS-TFT with high-kappa gate dielectric
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Ma, Ming-Wen; Chen, Chih-Yang; Su, Chun-Jung; Wu, Woei-Cherng; Wu, Yi-Hong; Kao, Kuo-Hsing; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:12:39Z |
Impacts of fluorine ion implantation with low-temperature solid-phase crystallized activation on high-kappa LTPS-TFT
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Ma, Ming-Wen; Chen, Chih-Yang; Su, Chun-Jung; Wu, Woei-Cherng; Wu, Yi-Hong; Yang, Tsung-Yu; Kao, Kuo-Hsing; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:12:13Z |
Reliability mechanisms of LTPS-TFT with HfO2 gate dielectric: PBTI, NBTI, and hot-carrier stress
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Ma, Ming-Wen; Chen, Chih-Yang; Wu, Woei-Cherrig; Su, Chun-Jung; Kao, Kuo-Hsing; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:11:36Z |
Mobility improvement of HfO2 LTPS-TFTs with nitrogen implanataion
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Ma, Ming-Wen; Yang, Tsung-Yu; Kao, Kuo-Hsing; Su, Chun-Jung; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:11:34Z |
Impacts of nitric acid oxidation on low-temperature polycrystalline silicon TFTs with high-k gate dielectric
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Yang, Tsung-Yu; Ma, Ming-Wen; Kao, Kuo-Hsing; Su, Chun-Jung; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:11:26Z |
High-performance metal-induced laterally crystallized polycrystalline silicon p-channel thin-film transistor with TaN/HfO2 gate stack structure
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Ma, Ming-Wen; Chao, Tien-Sheng; Su, Chun-Jung; Wu, Woei-Cherng; Kao, Kuo-Hsing; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:10:56Z |
X-ray photoelectron spectroscopy energy band alignment of spin-on CoTiO(3) high-k dielectric prepared by sol-gel spin coating method
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Kao, Kuo-Hsing; Chuang, Shiow-Huey; Wu, Woei-Cherng; Chao, Tien-Sheng; Chen, Jian-Hao; Ma, Ming-Wen; Gao, Reui-Hong; Chiang, Michael Y. |
| 國立成功大學 |
2014-12-07 |
Compressively strained SiGe band-to-band tunneling model calibration based on p-i-n diodes and prospect of strained SiGe tunneling field-effect transistors
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Kao, Kuo-Hsing; Verhulst, Anne S.; Rooyackers, Rita; Douhard, Bastien; Delmotte, Joris; Bender, Hugo; Richard, Olivier; Vandervorst, Wilfried; Simoen, Eddy; Hikavyy, Andriy; Loo, Roger; Arstila, Kai; Collaert, Nadine; Thean, Aaron; Heyns, Marc M.; De Meyer, Kristin |
| 國立成功大學 |
2007-03 |
Impact of high-k offset spacer in 65-nm node SOI devices
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Ma, Ming-Wen; Wu, Chien-Hung; Yang, Tsung-Yu; Kao, Kuo-Hsing; Wu, Woei-Cherng; Wang, Shui-Jinn; Chao, Tien-Sheng; Lei, Tan-Fu |
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