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"kao kuo hsing"的相关文件
显示项目 21-28 / 28 (共3页)
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| 國立交通大學 |
2014-12-08T15:12:39Z |
Impacts of fluorine ion implantation with low-temperature solid-phase crystallized activation on high-kappa LTPS-TFT
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Ma, Ming-Wen; Chen, Chih-Yang; Su, Chun-Jung; Wu, Woei-Cherng; Wu, Yi-Hong; Yang, Tsung-Yu; Kao, Kuo-Hsing; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:12:13Z |
Reliability mechanisms of LTPS-TFT with HfO2 gate dielectric: PBTI, NBTI, and hot-carrier stress
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Ma, Ming-Wen; Chen, Chih-Yang; Wu, Woei-Cherrig; Su, Chun-Jung; Kao, Kuo-Hsing; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:11:36Z |
Mobility improvement of HfO2 LTPS-TFTs with nitrogen implanataion
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Ma, Ming-Wen; Yang, Tsung-Yu; Kao, Kuo-Hsing; Su, Chun-Jung; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:11:34Z |
Impacts of nitric acid oxidation on low-temperature polycrystalline silicon TFTs with high-k gate dielectric
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Yang, Tsung-Yu; Ma, Ming-Wen; Kao, Kuo-Hsing; Su, Chun-Jung; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:11:26Z |
High-performance metal-induced laterally crystallized polycrystalline silicon p-channel thin-film transistor with TaN/HfO2 gate stack structure
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Ma, Ming-Wen; Chao, Tien-Sheng; Su, Chun-Jung; Wu, Woei-Cherng; Kao, Kuo-Hsing; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:10:56Z |
X-ray photoelectron spectroscopy energy band alignment of spin-on CoTiO(3) high-k dielectric prepared by sol-gel spin coating method
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Kao, Kuo-Hsing; Chuang, Shiow-Huey; Wu, Woei-Cherng; Chao, Tien-Sheng; Chen, Jian-Hao; Ma, Ming-Wen; Gao, Reui-Hong; Chiang, Michael Y. |
| 國立成功大學 |
2014-12-07 |
Compressively strained SiGe band-to-band tunneling model calibration based on p-i-n diodes and prospect of strained SiGe tunneling field-effect transistors
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Kao, Kuo-Hsing; Verhulst, Anne S.; Rooyackers, Rita; Douhard, Bastien; Delmotte, Joris; Bender, Hugo; Richard, Olivier; Vandervorst, Wilfried; Simoen, Eddy; Hikavyy, Andriy; Loo, Roger; Arstila, Kai; Collaert, Nadine; Thean, Aaron; Heyns, Marc M.; De Meyer, Kristin |
| 國立成功大學 |
2007-03 |
Impact of high-k offset spacer in 65-nm node SOI devices
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Ma, Ming-Wen; Wu, Chien-Hung; Yang, Tsung-Yu; Kao, Kuo-Hsing; Wu, Woei-Cherng; Wang, Shui-Jinn; Chao, Tien-Sheng; Lei, Tan-Fu |
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