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Showing items 1-16 of 16 (1 Page(s) Totally)
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| 國立臺灣科技大學 |
2010 |
The copper sulfide coating on polyacrylonitrile with a chelating agent of ethylenediaminetetraacetic acid by an electroless deposition method and its EMI shielding effectiveness
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Chen Y.-H.; Huang C.-Y.; Roan M.-L.; Lai F.-D.; Chen K.-N.; Yeh J.-T. |
| 國立臺灣科技大學 |
2009 |
Electroless deposition of the copper sulfide coating on polyacrylonitrile with a chelating agent of triethanolamine and its EMI Shielding Effectiveness
|
Chen Y.-H.; Huang C.-Y.; Lai F.-D.; Roan M.-L.; Chen K.-N.; Yeh J.-T. |
| 國立臺灣科技大學 |
2007 |
Application of an alternating phase-shifting mask design method to near-field photolithography for fabricating more than 2 GHz SAW devices
|
Lai, F.-D.;Hua, J.-M.;Huang, H.-M. |
| 國立臺灣科技大學 |
2007 |
The GHz surface acoustic wave filters fabricated by using an alternating phase-shifting mask design method
|
Lai, F.-D.;Hua, J.-M.;Huang, H.M. |
| 國立臺灣大學 |
2004 |
Design of a tri-layer bottom anti-reflective coating for KrF, ArF and F2 lithographies
|
Cheng, W. C.; Lai, F. D.; Huang, H. M.; Wang, Lon A. |
| 國立高雄第一科技大學 |
2003.11 |
Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously
|
Lai, F.D.;Chang, C.M.;Wang, L.A.;Yih, T.S. |
| 國立高雄第一科技大學 |
2003.06 |
Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line
|
Lai, F.D;Huang, C.Y;Chang, C.M;Wang, L.A;Cheng, W.C |
| 國立臺灣大學 |
2003 |
Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line
|
Lai, F. D.; Huang, C. Y.; Chang, C. M.; Wang, L. A.; Cheng, W. C. |
| 國立臺灣大學 |
2003 |
Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously
|
Lai, F. D.; Chang, C. M.; Wang, L. A.; Yih, T. S. |
| 國立高雄第一科技大學 |
2002.06 |
Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y superlattices for high transmittance APSM at 193 nm wavelength
|
LAI, F.D.;WANG, L.A. |
| 國立臺灣大學 |
2002 |
Fabrication and characterization of aluminum oxide/chromium oxide superlattice for attenuated phase-shifting mask working at 193 nm wavelength
|
Lai, F. D.; Wang, L. A. |
| 國立臺灣大學 |
2002 |
Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1?x?y superlattices for high transmittance APSM at 193 nm wavelength
|
Lai, F. D.; Wang, L. A. |
| 國立高雄第一科技大學 |
2001.12 |
Optical-constant tunable (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y optical superlattices for attenuated phase shift mask in ArF lithography
|
Lai, F.D.;Wang, L.A. |
| 國立臺灣大學 |
2001 |
Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelength
|
Lai, F. D.; Wang, L. A. |
| 國立臺灣大學 |
2001 |
Optical-constant tunable (ZrO2)x/(Cr2O3)y/(Al2O3)1–x–y optical superlattices for attenuated phase shift mask in ArF lithography
|
Lai, F. D.; Wang, L. A. |
| 國立高雄第一科技大學 |
1999.07 |
Silicon-oxynitride films prepared for 157 nm attenuated phase shifting masks
|
Chen, Hsuen-Li;Wang, L.A.;Yeh, L.S.;Lai, F.D. |
Showing items 1-16 of 16 (1 Page(s) Totally)
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