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Showing items 1-4 of 4 (1 Page(s) Totally)
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| 國立臺灣大學 |
2001-10 |
Novel ultra thin gate oxide growth technique by alternating current anodization
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Hwu, Jenn-Gwo; Lee, Chuang-Yuan; Ting, Chieh-Chih; Chen, Wei-Len |
| 臺大學術典藏 |
2001-10 |
Novel ultra thin gate oxide growth technique by alternating current anodization
|
Hwu, Jenn-Gwo; Lee, Chuang-Yuan; Ting, Chieh-Chih; Chen, Wei-Len; Hwu, Jenn-Gwo; Lee, Chuang-Yuan; Ting, Chieh-Chih; Chen, Wei-Len |
| 國立臺灣大學 |
2001 |
Ultra-thin gate oxides prepared by alternating current anodization of silicon followed by rapid thermal anneal
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Chen, Yung-Chieh; Lee, Chuang-Yuan; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
2001 |
Improvement in oxide thickness uniformity by repeated spikeoxidation
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Hong, Chao-Chi; Lee, Chuang-Yuan; Hsieh, Yuan-Long; Liu, Chean-Chung; Fong, I.-K.; Hwu, Jenn-Gwo |
Showing items 1-4 of 4 (1 Page(s) Totally)
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