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机构 日期 题名 作者
國立交通大學 2019-04-02T06:00:53Z A novel structure for three-dimensional silicon magnetic transducers to improve the sensitivity symmetry Lin, HY; Lei, TF; Jeng, JJ; Pan, CL; Chang, CY
國立交通大學 2019-04-02T06:00:52Z Suppression of boron penetration in BF2+-implanted poly-Si gate Chao, TS; Chu, CH; Wang, CF; Ho, KJ; Lei, TF; Lee, CL
國立交通大學 2019-04-02T06:00:22Z MOS magnetic current sensor based on standard CMOS process Yang, HM; Lei, TF; Huang, YC; Lee, CL
國立交通大學 2019-04-02T05:59:49Z Improvement of water-related hot-carrier reliability by optimizing the plasma-enhanced tetra-ethoxysilane deposition process Lin, YM; Jang, SM; Yu, CH; Lei, TF
國立交通大學 2019-04-02T05:59:48Z Monitoring trapped charge generation for gate oxide under stress Lin, YH; Lee, CL; Lei, TF
國立交通大學 2019-04-02T05:59:45Z Plasma charging damage and water-related hot-carrier reliability in the deposition of plasma-enhanced tetraethylorthosilicate oxide Lin, YM; Jang, SM; Yu, CH; Lei, TF; Chen, JY
國立交通大學 2019-04-02T05:59:33Z Improvement of reliability of metal-oxide semiconductor field-effect transistors with N2O nitrided gate oxide and N2O polysilicon gate reoxidation Lai, CS; Chao, TS; Lei, TF; Lee, CL; Huang, TY; Chang, CY
國立交通大學 2019-04-02T05:59:28Z A NOVEL PLANARIZATION OF TRENCH ISOLATION USING POLYSILICON REFILL AND ETCHBACK OF CHEMICAL-MECHANICAL POLISH CHENG, JY; LEI, TF; CHAO, TS
國立交通大學 2019-04-02T05:59:15Z Correlation of stress-induced leakage current with generated positive trapped charges for ultrathin gate oxide Lin, YH; Lee, CL; Lei, TF
國立交通大學 2019-04-02T05:58:33Z Mechanism of nitrogen coimplant for suppressing boron penetration in p(+)-polycrystalline silicon gate of p metal-oxide semiconductor field effect transistor Chao, TS; Liaw, MC; Chu, CH; Chang, CY; Chien, CH; Hao, CP; Lei, TF
國立交通大學 2019-04-02T05:58:27Z Low-temperature and low thermal budget fabrication of polycrystalline silicon thin-film transistors Lin, HY; Chang, CY; Lei, TF; Liu, FM; Yang, WL; Cheng, JY; Tseng, HC; Chen, LP
國立交通大學 2014-12-08T15:49:22Z Correlation of stress-induced leakage current with generated positive trapped charges for ultrathin gate oxide Lin, YH; Lee, CL; Lei, TF
國立交通大學 2014-12-08T15:49:13Z Characterization of polysilicon oxides thermally grown and deposited on the polished polysilicon films Lei, TF; Cheng, JY; Shiau, SY; Chao, TS; Lai, CS
國立交通大學 2014-12-08T15:48:55Z Comparison of N-2 and NH3 plasma passivation effects on polycrystalline silicon thin-film transistors Lee, YS; Lin, HY; Lei, TF; Huang, TY; Chang, TC; Chang, CY
國立交通大學 2014-12-08T15:48:54Z Controlling the diffusion of implanted boron in Si and silicide by multiple implants Chu, CH; Ho, KJ; Huang, CT; Shvu, SH; Lei, TF
國立交通大學 2014-12-08T15:47:36Z Improvement of reliability of metal-oxide semiconductor field-effect transistors with N2O nitrided gate oxide and N2O polysilicon gate reoxidation Lai, CS; Chao, TS; Lei, TF; Lee, CL; Huang, TY; Chang, CY
國立交通大學 2014-12-08T15:46:44Z Improvement of ultra-thin 3.3 nm thick oxide for co-salicide process using NF3 annealed poly-gate Chang, TY; Lei, TF; Chao, TS; Huang, CT; Chen, SK; Tuan, A; Chou, S
國立交通大學 2014-12-08T15:46:40Z Enhancement of integrity of polysilicon oxide by using a combination of N2O nitridation and CMP process Lei, TF; Chen, JH; Wang, MF; Chao, TS
國立交通大學 2014-12-08T15:46:12Z A novel Si-B diffusion source for p(+)-poly-Si gate Chao, TS; Kuo, CP; Chen, TP; Lei, TF
國立交通大學 2014-12-08T15:46:06Z Improvement of junction leakage of nickel silicided junction by a Ti-capping layer Hou, TH; Lei, TF; Chao, TS
國立交通大學 2014-12-08T15:45:23Z Low contact resistance of poly-plug structure by in-situ HF-vapour cleaning Chen, JH; Lei, TF; Chao, TS; Su, TP; Huang, SJ; Tuan, A; Chen, SK
國立交通大學 2014-12-08T15:45:12Z Improvement of polysilicon oxide integrity using NF3-annealing Yang, WL; Shieh, MS; Chen, YM; Chao, TS; Liu, DG; Lei, TF
國立交通大學 2014-12-08T15:45:06Z Novel cleaning solutions for polysilicon film post chemical mechanical polishing Pan, TM; Lei, TF; Chen, CC; Chao, TS; Liaw, MC; Yang, WL; Tsai, MS; Lu, CP; Chang, WH
國立交通大學 2014-12-08T15:45:01Z Robust ultrathin oxynitride dielectrics by NH3 nitridation and N2O RTA treatment Pan, TM; Lei, TF; Chao, TS
國立交通大學 2014-12-08T15:45:00Z Characteristics of polysilicon oxides combining N2O nitridation and CMP processes Lei, TF; Chen, JH; Wang, MF; Chao, TS

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