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Showing items 1-50 of 214 (5 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T06:00:53Z |
A novel structure for three-dimensional silicon magnetic transducers to improve the sensitivity symmetry
|
Lin, HY; Lei, TF; Jeng, JJ; Pan, CL; Chang, CY |
| 國立交通大學 |
2019-04-02T06:00:52Z |
Suppression of boron penetration in BF2+-implanted poly-Si gate
|
Chao, TS; Chu, CH; Wang, CF; Ho, KJ; Lei, TF; Lee, CL |
| 國立交通大學 |
2019-04-02T06:00:22Z |
MOS magnetic current sensor based on standard CMOS process
|
Yang, HM; Lei, TF; Huang, YC; Lee, CL |
| 國立交通大學 |
2019-04-02T05:59:49Z |
Improvement of water-related hot-carrier reliability by optimizing the plasma-enhanced tetra-ethoxysilane deposition process
|
Lin, YM; Jang, SM; Yu, CH; Lei, TF |
| 國立交通大學 |
2019-04-02T05:59:48Z |
Monitoring trapped charge generation for gate oxide under stress
|
Lin, YH; Lee, CL; Lei, TF |
| 國立交通大學 |
2019-04-02T05:59:45Z |
Plasma charging damage and water-related hot-carrier reliability in the deposition of plasma-enhanced tetraethylorthosilicate oxide
|
Lin, YM; Jang, SM; Yu, CH; Lei, TF; Chen, JY |
| 國立交通大學 |
2019-04-02T05:59:33Z |
Improvement of reliability of metal-oxide semiconductor field-effect transistors with N2O nitrided gate oxide and N2O polysilicon gate reoxidation
|
Lai, CS; Chao, TS; Lei, TF; Lee, CL; Huang, TY; Chang, CY |
| 國立交通大學 |
2019-04-02T05:59:28Z |
A NOVEL PLANARIZATION OF TRENCH ISOLATION USING POLYSILICON REFILL AND ETCHBACK OF CHEMICAL-MECHANICAL POLISH
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CHENG, JY; LEI, TF; CHAO, TS |
| 國立交通大學 |
2019-04-02T05:59:15Z |
Correlation of stress-induced leakage current with generated positive trapped charges for ultrathin gate oxide
|
Lin, YH; Lee, CL; Lei, TF |
| 國立交通大學 |
2019-04-02T05:58:33Z |
Mechanism of nitrogen coimplant for suppressing boron penetration in p(+)-polycrystalline silicon gate of p metal-oxide semiconductor field effect transistor
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Chao, TS; Liaw, MC; Chu, CH; Chang, CY; Chien, CH; Hao, CP; Lei, TF |
| 國立交通大學 |
2019-04-02T05:58:27Z |
Low-temperature and low thermal budget fabrication of polycrystalline silicon thin-film transistors
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Lin, HY; Chang, CY; Lei, TF; Liu, FM; Yang, WL; Cheng, JY; Tseng, HC; Chen, LP |
| 國立交通大學 |
2014-12-08T15:49:22Z |
Correlation of stress-induced leakage current with generated positive trapped charges for ultrathin gate oxide
|
Lin, YH; Lee, CL; Lei, TF |
| 國立交通大學 |
2014-12-08T15:49:13Z |
Characterization of polysilicon oxides thermally grown and deposited on the polished polysilicon films
|
Lei, TF; Cheng, JY; Shiau, SY; Chao, TS; Lai, CS |
| 國立交通大學 |
2014-12-08T15:48:55Z |
Comparison of N-2 and NH3 plasma passivation effects on polycrystalline silicon thin-film transistors
|
Lee, YS; Lin, HY; Lei, TF; Huang, TY; Chang, TC; Chang, CY |
| 國立交通大學 |
2014-12-08T15:48:54Z |
Controlling the diffusion of implanted boron in Si and silicide by multiple implants
|
Chu, CH; Ho, KJ; Huang, CT; Shvu, SH; Lei, TF |
| 國立交通大學 |
2014-12-08T15:47:36Z |
Improvement of reliability of metal-oxide semiconductor field-effect transistors with N2O nitrided gate oxide and N2O polysilicon gate reoxidation
|
Lai, CS; Chao, TS; Lei, TF; Lee, CL; Huang, TY; Chang, CY |
| 國立交通大學 |
2014-12-08T15:46:44Z |
Improvement of ultra-thin 3.3 nm thick oxide for co-salicide process using NF3 annealed poly-gate
|
Chang, TY; Lei, TF; Chao, TS; Huang, CT; Chen, SK; Tuan, A; Chou, S |
| 國立交通大學 |
2014-12-08T15:46:40Z |
Enhancement of integrity of polysilicon oxide by using a combination of N2O nitridation and CMP process
|
Lei, TF; Chen, JH; Wang, MF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:46:12Z |
A novel Si-B diffusion source for p(+)-poly-Si gate
|
Chao, TS; Kuo, CP; Chen, TP; Lei, TF |
| 國立交通大學 |
2014-12-08T15:46:06Z |
Improvement of junction leakage of nickel silicided junction by a Ti-capping layer
|
Hou, TH; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:45:23Z |
Low contact resistance of poly-plug structure by in-situ HF-vapour cleaning
|
Chen, JH; Lei, TF; Chao, TS; Su, TP; Huang, SJ; Tuan, A; Chen, SK |
| 國立交通大學 |
2014-12-08T15:45:12Z |
Improvement of polysilicon oxide integrity using NF3-annealing
|
Yang, WL; Shieh, MS; Chen, YM; Chao, TS; Liu, DG; Lei, TF |
| 國立交通大學 |
2014-12-08T15:45:06Z |
Novel cleaning solutions for polysilicon film post chemical mechanical polishing
|
Pan, TM; Lei, TF; Chen, CC; Chao, TS; Liaw, MC; Yang, WL; Tsai, MS; Lu, CP; Chang, WH |
| 國立交通大學 |
2014-12-08T15:45:01Z |
Robust ultrathin oxynitride dielectrics by NH3 nitridation and N2O RTA treatment
|
Pan, TM; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:45:00Z |
Characteristics of polysilicon oxides combining N2O nitridation and CMP processes
|
Lei, TF; Chen, JH; Wang, MF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:51Z |
High quality ultrathin CoTiO3 high-k gate dielectrics
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Pan, TM; Lei, TF; Chao, TS; Chang, KL; Hsieh, KC |
| 國立交通大學 |
2014-12-08T15:44:48Z |
Postexposure delay effect on linewidth variation in base added chemically amplified resist
|
Ku, CY; Shieh, JM; Chiou, TB; Lin, HK; Lei, TF |
| 國立交通大學 |
2014-12-08T15:44:47Z |
Optimum conditions for novel one-step cleaning method for pre-gate oxide cleaning using robust design methodology
|
Pan, TM; Lei, TF; Chao, TS; Liaw, MC; Lu, CP |
| 國立交通大學 |
2014-12-08T15:44:41Z |
Characteristics of TEOS polysilicon oxides: Improvement by CMP and high temperature RTA N-2/N2O annealing
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Chen, JH; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:20Z |
A novel thin-film transistor with self-aligned field induced drain
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Lin, HC; Yu, CM; Lin, CY; Yeh, KL; Huang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:44:15Z |
High quality interpoly-oxynitride grown by NH3 nitridation and N2O RTA treatment
|
Pan, TM; Lei, TF; Yang, WL; Cheng, CM; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:05Z |
High-k cobalt-titanium oxide dielectrics formed by oxidation of sputtered Co/Ti or Ti/Co films
|
Pan, TM; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:02Z |
Comparison of ultrathin CoTiO3 and NiTiO3 high-k gate dielectrics
|
Pan, TM; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:00Z |
High reliability polyoxide fabricated by using TEOS oxide deposited on disilane polysilicon film
|
Lee, JW; Lee, CL; Lei, TF; Lai, CS |
| 國立交通大學 |
2014-12-08T15:43:52Z |
Characterization of ultrathin oxynitride (18-21 angstrom) gate dielectrics by NH3 nitridation and N2O RTA treatment
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Pan, TM; Lei, TF; Wen, HC; Chao, TS |
| 國立交通大學 |
2014-12-08T15:43:50Z |
One-step cleaning solution to replace the conventional RCA two-step cleaning recipe for pregate oxide cleaning
|
Pan, TM; Lei, TF; Chao, TS; Liaw, MC; Ko, FH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:43:47Z |
Focus measurement with a simple pattern design
|
Ku, CY; Lei, TF; Lin, HK |
| 國立交通大學 |
2014-12-08T15:43:39Z |
High quality interpoly dielectrics deposited on the nitrided-polysilicon for nonvolatile memory devices
|
Yang, WL; Chao, TS; Cheng, CM; Pan, TM; Lei, TF |
| 國立交通大學 |
2014-12-08T15:43:37Z |
The enhancement of nitrogen incorporation in RTN2O annealed TEOS oxide fabricated on disilane-based polysilicon films
|
Lee, JW; Chen, WD; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:43:37Z |
Expanding the process window and reducing the optical proximity effect by post-exposure delay
|
Ku, CY; Shieh, JM; Chiou, TB; Lin, HK; Lei, TF |
| 國立交通大學 |
2014-12-08T15:43:31Z |
Improvements in both thermal stability of Ni-silicide and electrical reliability of gate oxides using a stacked polysilicon gate structure
|
Lee, JW; Lin, SX; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:43:30Z |
Monitoring lithographic focus and tilting performance by off-line overlay measurement tools
|
Ku, CY; Lei, TF; Cheng, DS |
| 國立交通大學 |
2014-12-08T15:43:27Z |
Electrical characteristics of thin cerium oxide film on silicon substrate by reactive DC sputtering
|
Pan, TM; Chien, CH; Lei, TF; Chao, TS; Huang, TY |
| 國立交通大學 |
2014-12-08T15:43:27Z |
An investigation of scanning capacitance microscopy on iron-contaminated p-type silicon
|
Chang, MN; Chang, TY; Pan, FM; Wu, BW; Lei, TF |
| 國立交通大學 |
2014-12-08T15:43:19Z |
Thin tunnel oxide grown on silicon substrate pretreated by CF4 plasma
|
Lee, JW; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:43:18Z |
Comparison of novel cleaning solutions, with various chelating agents for post-CMP cleaning on poly-Si film
|
Pan, TM; Lei, TF; Ko, FH; Chao, TS; Chiu, TH; Lee, YH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:43:07Z |
Nitrogen implantation and in situ HF vapor clean for deep submicrometer n-MOSFETs
|
Chen, JH; Lei, TF; Chen, CL; Chao, TS; Wen, WY; Chen, KT |
| 國立交通大學 |
2014-12-08T15:42:25Z |
Characteristics of polycrystalline silicon thin-film transistors with electrical source/drain extensions induced by a bottom sub-gate
|
Yu, M; Lin, HC; Chen, GH; Huang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:42:23Z |
Performance evaluation of cleaning solutions enhanced with tetraalkylammonium hydroxide substituents for post-CMP cleaning on poly-Si film
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Pan, TM; Lei, TF; Ko, FH; Chao, TS; Liaw, MC; Lee, YH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:42:22Z |
Thin oxides grown on disilane-based polysilicon
|
Lee, JW; Lei, TF; Lee, CL |
Showing items 1-50 of 214 (5 Page(s) Totally)
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