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Showing items 26-50 of 214 (9 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:44:51Z |
High quality ultrathin CoTiO3 high-k gate dielectrics
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Pan, TM; Lei, TF; Chao, TS; Chang, KL; Hsieh, KC |
| 國立交通大學 |
2014-12-08T15:44:48Z |
Postexposure delay effect on linewidth variation in base added chemically amplified resist
|
Ku, CY; Shieh, JM; Chiou, TB; Lin, HK; Lei, TF |
| 國立交通大學 |
2014-12-08T15:44:47Z |
Optimum conditions for novel one-step cleaning method for pre-gate oxide cleaning using robust design methodology
|
Pan, TM; Lei, TF; Chao, TS; Liaw, MC; Lu, CP |
| 國立交通大學 |
2014-12-08T15:44:41Z |
Characteristics of TEOS polysilicon oxides: Improvement by CMP and high temperature RTA N-2/N2O annealing
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Chen, JH; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:20Z |
A novel thin-film transistor with self-aligned field induced drain
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Lin, HC; Yu, CM; Lin, CY; Yeh, KL; Huang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:44:15Z |
High quality interpoly-oxynitride grown by NH3 nitridation and N2O RTA treatment
|
Pan, TM; Lei, TF; Yang, WL; Cheng, CM; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:05Z |
High-k cobalt-titanium oxide dielectrics formed by oxidation of sputtered Co/Ti or Ti/Co films
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Pan, TM; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:02Z |
Comparison of ultrathin CoTiO3 and NiTiO3 high-k gate dielectrics
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Pan, TM; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:44:00Z |
High reliability polyoxide fabricated by using TEOS oxide deposited on disilane polysilicon film
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Lee, JW; Lee, CL; Lei, TF; Lai, CS |
| 國立交通大學 |
2014-12-08T15:43:52Z |
Characterization of ultrathin oxynitride (18-21 angstrom) gate dielectrics by NH3 nitridation and N2O RTA treatment
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Pan, TM; Lei, TF; Wen, HC; Chao, TS |
| 國立交通大學 |
2014-12-08T15:43:50Z |
One-step cleaning solution to replace the conventional RCA two-step cleaning recipe for pregate oxide cleaning
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Pan, TM; Lei, TF; Chao, TS; Liaw, MC; Ko, FH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:43:47Z |
Focus measurement with a simple pattern design
|
Ku, CY; Lei, TF; Lin, HK |
| 國立交通大學 |
2014-12-08T15:43:39Z |
High quality interpoly dielectrics deposited on the nitrided-polysilicon for nonvolatile memory devices
|
Yang, WL; Chao, TS; Cheng, CM; Pan, TM; Lei, TF |
| 國立交通大學 |
2014-12-08T15:43:37Z |
The enhancement of nitrogen incorporation in RTN2O annealed TEOS oxide fabricated on disilane-based polysilicon films
|
Lee, JW; Chen, WD; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:43:37Z |
Expanding the process window and reducing the optical proximity effect by post-exposure delay
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Ku, CY; Shieh, JM; Chiou, TB; Lin, HK; Lei, TF |
| 國立交通大學 |
2014-12-08T15:43:31Z |
Improvements in both thermal stability of Ni-silicide and electrical reliability of gate oxides using a stacked polysilicon gate structure
|
Lee, JW; Lin, SX; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:43:30Z |
Monitoring lithographic focus and tilting performance by off-line overlay measurement tools
|
Ku, CY; Lei, TF; Cheng, DS |
| 國立交通大學 |
2014-12-08T15:43:27Z |
Electrical characteristics of thin cerium oxide film on silicon substrate by reactive DC sputtering
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Pan, TM; Chien, CH; Lei, TF; Chao, TS; Huang, TY |
| 國立交通大學 |
2014-12-08T15:43:27Z |
An investigation of scanning capacitance microscopy on iron-contaminated p-type silicon
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Chang, MN; Chang, TY; Pan, FM; Wu, BW; Lei, TF |
| 國立交通大學 |
2014-12-08T15:43:19Z |
Thin tunnel oxide grown on silicon substrate pretreated by CF4 plasma
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Lee, JW; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:43:18Z |
Comparison of novel cleaning solutions, with various chelating agents for post-CMP cleaning on poly-Si film
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Pan, TM; Lei, TF; Ko, FH; Chao, TS; Chiu, TH; Lee, YH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:43:07Z |
Nitrogen implantation and in situ HF vapor clean for deep submicrometer n-MOSFETs
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Chen, JH; Lei, TF; Chen, CL; Chao, TS; Wen, WY; Chen, KT |
| 國立交通大學 |
2014-12-08T15:42:25Z |
Characteristics of polycrystalline silicon thin-film transistors with electrical source/drain extensions induced by a bottom sub-gate
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Yu, M; Lin, HC; Chen, GH; Huang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:42:23Z |
Performance evaluation of cleaning solutions enhanced with tetraalkylammonium hydroxide substituents for post-CMP cleaning on poly-Si film
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Pan, TM; Lei, TF; Ko, FH; Chao, TS; Liaw, MC; Lee, YH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:42:22Z |
Thin oxides grown on disilane-based polysilicon
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Lee, JW; Lei, TF; Lee, CL |
Showing items 26-50 of 214 (9 Page(s) Totally)
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