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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
國立交通大學 2019-05-02T00:25:53Z Comparison of the Physical and Electrical Properties of HfO2/Al2O3/HfO2/GeOx/Ge and HfO2/Al2O3/GeOx/Ge Gate Stacks Tsai, Yi-He; Chou, Chen-Han; Li, Hui-Hsuan; Yeh, Wen-Kuan; Lino, Yu-Hsien; Ko, Fu-Hsiang; Chien, Chao-Hsin

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