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Showing items 1-14 of 14 (1 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T05:59:28Z |
INVESTIGATION OF A HIGH-QUALITY AND ULTRAVIOLET-LIGHT TRANSPARENT PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATION
|
WANG, CK; YING, TL; WEI, CS; LIU, LM |
| 國立交通大學 |
2019-04-02T05:59:28Z |
AN EFFICIENT PRECLEAN OF ALUMINIZED SILICON SUBSTRATE FOR CHEMICAL-VAPOR-DEPOSITION OF SUBMICRON TUNGSTEN PLUGS
|
YEH, WK; TSAI, MH; CHEN, SH; CHEN, MC; WANG, PJ; LIU, LM; LIN, MS |
| 國立交通大學 |
2019-04-02T05:58:32Z |
Enhanced metalorganic chemical vapor deposition titanium nitride film fabricated using tetrakis-dimethylamino-titanium for barrier metal application in sub-half-micron technology
|
Wang, CK; Liu, LM; Liao, M; Cheng, HC; Lin, MS |
| 國立交通大學 |
2014-12-08T15:27:52Z |
CHARACTERIZATION OF A HIGH-QUALITY AND UV-TRANSPARENT PECVD SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATIONS
|
WANG, CK; YING, TL; WEI, CS; LIU, LM; CHENG, HC; LIN, MS |
| 國立交通大學 |
2014-12-08T15:27:30Z |
Optimization of PVD Ti/CVD TiN liner for 0.35 mu m tungsten plug technology
|
Wang, CK; Liu, LM; Liao, DM; Smith, DC; Danek, M |
| 國立交通大學 |
2014-12-08T15:20:08Z |
FORECASTING RESIDENTIAL CONSUMPTION OF NATURAL-GAS USING MONTHLY AND QUARTERLY TIME-SERIES
|
LIU, LM; LIN, MW |
| 國立交通大學 |
2014-12-08T15:05:06Z |
DIRECT EVIDENCE OF GATE OXIDE THICKNESS INCREASE IN TUNGSTEN POLYCIDE PROCESSES
|
HSU, SL; LIU, LM; LIN, MS; CHANG, CY |
| 國立交通大學 |
2014-12-08T15:04:41Z |
FIELD INVERSION GENERATED IN THE CMOS DOUBLE-METAL PROCESS DUE TO PETEOS AND SOG INTERACTIONS
|
HSU, SL; LIU, LM; FANG, CH; YING, SL; CHEN, TL; LIN, MS; CHANG, CY |
| 國立交通大學 |
2014-12-08T15:03:12Z |
INVESTIGATION OF A HIGH-QUALITY AND ULTRAVIOLET-LIGHT TRANSPARENT PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATION
|
WANG, CK; YING, TL; WEI, CS; LIU, LM |
| 國立交通大學 |
2014-12-08T15:03:10Z |
AN EFFICIENT PRECLEAN OF ALUMINIZED SILICON SUBSTRATE FOR CHEMICAL-VAPOR-DEPOSITION OF SUBMICRON TUNGSTEN PLUGS
|
YEH, WK; TSAI, MH; CHEN, SH; CHEN, MC; WANG, PJ; LIU, LM; LIN, MS |
| 國立交通大學 |
2014-12-08T15:03:01Z |
Selective tungsten CVD on submicron contact hole
|
Yeh, WK; Chen, MC; Wang, PJ; Liu, LM; Lin, MS |
| 國立交通大學 |
2014-12-08T15:03:01Z |
Thermal stability of AlSiCu/W/n(+)p diodes with and without TiN barrier layer
|
Yeh, WK; Chen, MC; Wang, PJ; Liu, LM; Lin, MS |
| 國立交通大學 |
2014-12-08T15:02:27Z |
Enhanced metalorganic chemical vapor deposition titanium nitride film fabricated using tetrakis-dimethylamino-titanium for barrier metal application in sub-half-micron technology
|
Wang, CK; Liu, LM; Liao, M; Cheng, HC; Lin, MS |
| 國立交通大學 |
2014-12-08T15:02:22Z |
Deposition properties of selective tungsten chemical vapor deposition
|
Yeh, WK; Chen, MC; Wang, PJ; Liu, LM; Lin, MS |
Showing items 1-14 of 14 (1 Page(s) Totally)
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