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机构 日期 题名 作者
國立交通大學 2019-04-02T05:59:28Z INVESTIGATION OF A HIGH-QUALITY AND ULTRAVIOLET-LIGHT TRANSPARENT PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATION WANG, CK; YING, TL; WEI, CS; LIU, LM
國立交通大學 2019-04-02T05:59:28Z AN EFFICIENT PRECLEAN OF ALUMINIZED SILICON SUBSTRATE FOR CHEMICAL-VAPOR-DEPOSITION OF SUBMICRON TUNGSTEN PLUGS YEH, WK; TSAI, MH; CHEN, SH; CHEN, MC; WANG, PJ; LIU, LM; LIN, MS
國立交通大學 2019-04-02T05:58:32Z Enhanced metalorganic chemical vapor deposition titanium nitride film fabricated using tetrakis-dimethylamino-titanium for barrier metal application in sub-half-micron technology Wang, CK; Liu, LM; Liao, M; Cheng, HC; Lin, MS
國立交通大學 2014-12-08T15:27:52Z CHARACTERIZATION OF A HIGH-QUALITY AND UV-TRANSPARENT PECVD SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATIONS WANG, CK; YING, TL; WEI, CS; LIU, LM; CHENG, HC; LIN, MS
國立交通大學 2014-12-08T15:27:30Z Optimization of PVD Ti/CVD TiN liner for 0.35 mu m tungsten plug technology Wang, CK; Liu, LM; Liao, DM; Smith, DC; Danek, M
國立交通大學 2014-12-08T15:20:08Z FORECASTING RESIDENTIAL CONSUMPTION OF NATURAL-GAS USING MONTHLY AND QUARTERLY TIME-SERIES LIU, LM; LIN, MW
國立交通大學 2014-12-08T15:05:06Z DIRECT EVIDENCE OF GATE OXIDE THICKNESS INCREASE IN TUNGSTEN POLYCIDE PROCESSES HSU, SL; LIU, LM; LIN, MS; CHANG, CY
國立交通大學 2014-12-08T15:04:41Z FIELD INVERSION GENERATED IN THE CMOS DOUBLE-METAL PROCESS DUE TO PETEOS AND SOG INTERACTIONS HSU, SL; LIU, LM; FANG, CH; YING, SL; CHEN, TL; LIN, MS; CHANG, CY
國立交通大學 2014-12-08T15:03:12Z INVESTIGATION OF A HIGH-QUALITY AND ULTRAVIOLET-LIGHT TRANSPARENT PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATION WANG, CK; YING, TL; WEI, CS; LIU, LM
國立交通大學 2014-12-08T15:03:10Z AN EFFICIENT PRECLEAN OF ALUMINIZED SILICON SUBSTRATE FOR CHEMICAL-VAPOR-DEPOSITION OF SUBMICRON TUNGSTEN PLUGS YEH, WK; TSAI, MH; CHEN, SH; CHEN, MC; WANG, PJ; LIU, LM; LIN, MS
國立交通大學 2014-12-08T15:03:01Z Selective tungsten CVD on submicron contact hole Yeh, WK; Chen, MC; Wang, PJ; Liu, LM; Lin, MS
國立交通大學 2014-12-08T15:03:01Z Thermal stability of AlSiCu/W/n(+)p diodes with and without TiN barrier layer Yeh, WK; Chen, MC; Wang, PJ; Liu, LM; Lin, MS
國立交通大學 2014-12-08T15:02:27Z Enhanced metalorganic chemical vapor deposition titanium nitride film fabricated using tetrakis-dimethylamino-titanium for barrier metal application in sub-half-micron technology Wang, CK; Liu, LM; Liao, M; Cheng, HC; Lin, MS
國立交通大學 2014-12-08T15:02:22Z Deposition properties of selective tungsten chemical vapor deposition Yeh, WK; Chen, MC; Wang, PJ; Liu, LM; Lin, MS

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