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Showing items 46-70 of 86  (4 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:39:45Z CMP of low-k methylsilsesquiazane with oxygen plasma treatment for multilevel interconnect applications Chang, TC; Tsai, TM; Liu, PT; Chen, CW; Yan, ST; Aoki, H; Chang, YC; Tseng, TY
國立交通大學 2014-12-08T15:39:43Z Investigation of the electrical properties and reliability of amorphous SiCN Chen, CW; Chang, TC; Liu, PT; Tsai, TM; Huang, HC; Chen, JM; Tseng, CH; Liu, CC; Tseng, TY
國立交通大學 2014-12-08T15:39:42Z CMP of ultra low-k material porous-polysilazane (PPSZ) for interconnect applications Chang, TC; Tsai, TM; Liu, PT; Chen, CW; Yan, ST; Aoki, H; Chang, YC; Tseng, T
國立交通大學 2014-12-08T15:39:27Z Memory effect of oxide/SiC : O/oxide sandwiched structures Chang, TC; Yan, ST; Yang, FM; Liu, PT; Sze, SM
國立交通大學 2014-12-08T15:39:21Z A distributed charge storage with GeO2 nanodots Chang, TC; Yan, ST; Hsu, CH; Tang, MT; Lee, JF; Tai, YH; Liu, PT; Sze, SM
國立交通大學 2014-12-08T15:39:16Z Method to improve chemical-mechanical-planarization polishing rate of low-k methyl-silsesquiazane for ultralarge scale integrated interconnect application Chang, TC; Tsai, TM; Liu, PT; Yan, ST; Chang, YC; Aoki, H; Sze, SM; Tseng, TY
國立交通大學 2014-12-08T15:39:12Z Leakage behavior of the quasi-superlattice stack for multilevel charge storage Chang, TC; Yan, ST; Liu, PT; Chen, CW; Wu, HH; Sze, SM
國立交通大學 2014-12-08T15:39:11Z High-performance polycrystalline silicon thin-film transistor with multiple nanowire channels and lightly doped drain structure Wu, YC; Chang, TC; Chang, CY; Chen, CS; Tu, CH; Liu, PT; Zan, HW; Tai, YH
國立交通大學 2014-12-08T15:38:58Z Memory effect of oxide/SiC : O/oxide sandwiched structures" (vol 84, pg 2094, 2004) Chang, TC; Yan, ST; Yang, FM; Liu, PT; Sze, SM
國立交通大學 2014-12-08T15:38:48Z Quasisuperlattice storage: A concept of multilevel charge storage Chang, TC; Yan, ST; Liu, PT; Chen, CW; Wu, HH; Sze, SM
國立交通大學 2014-12-08T15:37:17Z Extraction of electrical mechanisms of low-dielectric constant material MSZ for interconnect applications (Vol 447, pg 516, 2004) Chang, TC; Yan, ST; Liu, PT; Lin, ZW; Aoki, H; Sze, SM
國立交通大學 2014-12-08T15:37:10Z Study on etching profile of nanoporous silica Chen, CW; Chang, TC; Liu, PT; Tsai, TM; Wu, HH; Tseng, TY
國立交通大學 2014-12-08T15:37:10Z Study on the effect of electron beam curing on low-K porous organosilicate glass (OSG) material Chang, TC; Tsai, TM; Liu, PT; Chen, CW; Tseng, TY
國立交通大學 2014-12-08T15:37:10Z Cu-penetration induced breakdown mechanism for a-SiCN Chen, CW; Liu, PT; Chang, TC; Yang, JH; Tsai, TM; Wu, HH; Tseng, TY
國立交通大學 2014-12-08T15:37:09Z Effect of carrier gas on the structure and electrical properties of low dielectric constant SiCOH film using trimethylsilane prepared by plasma enhanced chemical vapor deposition Cheng, YL; Wang, Y; Lan, JK; Chen, HC; Lin, JH; Wu, Y; Liu, PT; Feng, MS
國立交通大學 2014-12-08T15:37:06Z Effects of oxygen plasma ashing on barrier dielectric SiCN film Chen, CW; Chang, TC; Liu, PT; Tsai, TM; Tseng, TY
國立交通大學 2014-12-08T15:37:03Z Effects of channel width and NH3 plasma passivation on electrical characteristics of polysilicon thin-film transistors by pattern-dependent metal-induced lateral crystallization Wu, YC; Chang, TC; Chou, CW; Liu, PT; Tu, CH; Huang, WJ; Lou, JC; Chang, CY
國立交通大學 2014-12-08T15:37:01Z Memory effect of oxide/oxygen-incorporated silicon carbide/oxide sandwiched structure Chang, TC; Liu, PT; Yan, ST; Yang, FM; Sze, SM
國立交通大學 2014-12-08T15:36:06Z Electron charging and discharging effects of tungsten nanocrystals embedded in silicon dioxide for low-voltage nonvolatile memory technology Chang, TC; Liu, PT; Yan, ST; Sze, SM
國立交通大學 2014-12-08T15:36:06Z Electrical degradation of N-channel poly-Si TFT under AC stress Chen, CW; Chang, TC; Liu, PT; Lu, HY; Tsai, TM; Weng, CF; Hu, CW; Tseng, TY
國立交通大學 2014-12-08T15:36:05Z Enhanced performance of poly-Si thin film transistors using fluorine ions implantation Tu, CH; Chang, TC; Liu, PT; Zan, HW; Tai, YH; Yang, CY; Wu, YC; Liu, HC; Chen, WR; Chang, CY
國立交通大學 2014-12-08T15:36:04Z Improvement of reliability for polycrystalline thin-film transistors using self-aligned fluorinated silica glass spacers Tu, CH; Chang, TC; Liu, PT; Zan, HW; Tai, YH; Feng, LW; Wu, YC; Chang, CY
國立交通大學 2014-12-08T15:27:04Z High-performance integration of copper interconnects with low-k hydrogen silsesquioxane employing deuterium plasma treatment Liu, PT; Chang, TC; Yang, YL; Cheng, YF; Lee, JK; Shih, FY; Tsai, E; Chen, G; Sze, SM
國立交通大學 2014-12-08T15:25:43Z High performance and high reliability polysilicon thin-film transistors with multiple nano-wire channels Wu, YC; Chang, CY; Chang, TC; Liu, PT; Chen, CS; Tu, CH; Zan, HW; Tai, YH; Sze, SM
國立交通大學 2014-12-08T15:19:10Z Leakage conduction behavior in electron-beam-cured nanoporous silicate films Liu, PT; Tsai, TM; Chang, TC

Showing items 46-70 of 86  (4 Page(s) Totally)
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