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Taiwan Academic Institutional Repository >
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"lo wen cheng"
Showing items 1-10 of 14 (2 Page(s) Totally)
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| 亞洲大學 |
2019-09 |
Cerebro- and renoprotective activities through platelet-derived biomaterials against cerebrorenal syndrome in rat model.
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葉漢根;Yip, Hon-Kan;陳冠宏;Chen, Kuan-Hung;Kuma, Navneet;Dubey, Navneet Kumar;孫灼均;Sun, Cheuk-Kwan;Deng, Yue-Hua;Deng, Yue-Hua;Su, Chun-Wei;Su, Chun-Wei;Lo, Wen-Cheng;Lo, Wen-Cheng;Hsin-Chung, Chung C;Cheng, Hsin-Chung;鄧文炳;Deng, Win-Ping |
| 國立交通大學 |
2019-04-02T06:00:59Z |
Positive Bias Temperature Instability (PBTI) Characteristics of Contact-Etch-Stop-Layer-Induced Local-Tensile-Strained HfO2 nMOSFET
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Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng |
| 國立交通大學 |
2017-04-21T06:48:53Z |
Fluorinated HfO2 Gate Dielectrics Engineering for CMOS by pre- and post-CF4 Plasma Passivation
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Wu, Woei-Chemg; Lai, Chao-Sung; Lee, Shih-Ching; Ma, Ming-Wen; Chao, Tien-Sheng; Wang, Jer-Chyi; Hsu, Chih-Wei; Chou, Pai-Chi; Chen, Jian-Hao; Kao, Kuo-Hsing; Lo, Wen-Cheng; Lu, Tsung-Yi; Tay, Li-Lin; Rowell, Nelson |
| 國立交通大學 |
2014-12-08T15:14:32Z |
Systematical study of reliability issues in plasma-nitrided and thermally nitrided oxides for advanced dual-gate oxide p-channel metal-oxide-semiconductor field-effect transistors
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Lo, Wen-Cheng; Wu, Shien-Yang; Chang, Sun-Jay; Chiang, Mu-Chi; Lin, Chih-Yung; Chao, Tien-Sheng; Chang, Chun-Yen |
| 國立交通大學 |
2014-12-08T15:13:28Z |
Performance enhancement by local strain in (110) channel n-channel metal-oxide-semicondiactor field-effect transistors on (111) substrate
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Lo, Wen-Cheng; Ku, Ya-Hsin; Lee, Yao-Jen; Chao, Tien-Sheng; Chang, Chun-Yen |
| 國立交通大學 |
2014-12-08T15:12:56Z |
Performance and interface characterization for contact etch stop layer-strained nMOSFET with HfO2 gate dielectrics under pulsed-IV measurement
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Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng |
| 國立交通大學 |
2014-12-08T15:11:13Z |
Carrier transportation mechanism of the TaN/HfO(2)/IL/Si structure with silicon surface fluorine implantation
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Wu, Woei Cherng; Lai, Chao-Sung; Wang, Tzu-Ming; Wang, Jer-Chyi; Hsu, Chih Wei; Ma, Ming Wen; Lo, Wen-Cheng; Chao, Tien Sheng |
| 國立交通大學 |
2014-12-08T15:10:35Z |
Positive Bias Temperature Instability (PBTI) Characteristics of Contact-Etch-Stop-Layer-Induced Local-Tensile-Strained HfO(2) nMOSFET
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Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng |
| 國立交通大學 |
2014-12-08T15:07:34Z |
Performance enhancement for strained HfO(2) nMOSFET with contact etch stop layer (CESL) under pulsed-IV measurement
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Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng; Ho, Yi-Hsun |
| 國立交通大學 |
2014-12-08T15:02:04Z |
Trapping and de-trapping characteristics in PBTI and dynamic PBTI between HfO2 and HfSiON gate dielectrics
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Lin, We-Liang; Lee, Yao-Jen; Lo, Wen-Cheng; Chen, King-Sheng; Hou, Y. T.; Lin, K. C.; Chao, Tien-Sheng |
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