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"loh w l"
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| 國立成功大學 |
2004-07 |
Effect of halogen in high-density oxygen plasmas on photoresist trimming
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Sin, Chian-Yuh; Chen, Bing-Hung; Loh, W. L.; Yu, J.; Yelehanka, P.; See, A.; Chan, L. |
| 國立成功大學 |
2003-11-26 |
Photoresist trimming in oxygen-based high-density plasmas: Effect of HBr and Cl-2 addition to CF4/O-2 mixtures
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Sin, Chian-Yuh; Chen, Bing-Hung; Loh, W. L.; Yu, J.; Yelehanka, P.; See, A.; Chan, L. |
| 國立成功大學 |
2003-05 |
Resist trimming technique in CF4/O-2 high-density plasmas for sub-0.1 mu m MOSFET fabrication using 248-nm lithography
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Sin, Chian-Yuh; Chen, Bing-Hung; Loh, W. L.; Yu, J.; Yelehanka, P.; Chan, L. |
Showing items 1-3 of 3 (1 Page(s) Totally)
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