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教育部委託研究計畫 計畫執行:國立臺灣大學圖書館
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"loong wa"的相關文件
顯示項目 21-32 / 32 (共2頁)
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每頁顯示[10|25|50]項目
| 國立交通大學 |
2014-12-08T15:05:16Z |
PHOTOACID CATALYZED MAIN CHAIN SCISSION OF POLY(BUTENE-1 SULFONE) AS A DEEP UV POSITIVE RESIST
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LOONG, WA; CHANG, HW |
| 國立交通大學 |
2014-12-08T15:05:13Z |
ENHANCED OXYGEN PLASMA STRIPPING OF P+-IMPLANTED NEGATIVE RESIST BY HYDROGEN PLASMA PRETREATMENT - TEMPERATURE EFFECTS
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LOONG, WA; YEN, MS |
| 國立交通大學 |
2014-12-08T15:05:12Z |
OXIDATION OF GAAS SURFACE BY OXYGEN PLASMA AND ITS APPLICATION AS AN ANTIREFLECTION LAYER
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LOONG, WA; CHANG, HL |
| 國立交通大學 |
2014-12-08T15:05:10Z |
PROCESSES OF TOP-IMAGED SINGLE-LAYER RESISTS BY POTASSIUM-ION TREATMENT IN SOLUTION
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LOONG, WA; SU, AN; WANG, JL; CHU, CY |
| 國立交通大學 |
2014-12-08T15:05:10Z |
THE SIMULATION OF CONTRAST-ENHANCED LITHOGRAPHY
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LOONG, WA; PAN, HT |
| 國立交通大學 |
2014-12-08T15:05:05Z |
TITANIUM MONONITRIDE AS AN ANTIREFLECTION LAYER ON ALUMINUM METALLIZATION FOR SUBMICRON PHOTOLITHOGRAPHIC PATTERNING
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LOONG, WA; CHIU, KD |
| 國立交通大學 |
2014-12-08T15:04:50Z |
POLY(DIMETHYL-CO-DIPHENYLSILANE) AS A DEEP-UV AND AN OXYGEN PLASMA PORTABLE CONFORMABLE MASK
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LOONG, WA; WANG, TH |
| 國立交通大學 |
2014-12-08T15:04:35Z |
ENHANCED O2 PLASMA STRIPPING OF P+ AND SI+ IMPLANTED NEGATIVE RESIST BY H2 PLASMA PRETREATMENT
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LOONG, WA; YEN, MS; WANG, FC; HSU, BY; LIU, YL |
| 國立交通大學 |
2014-12-08T15:04:14Z |
CROSS SHAPED PATTERN ON CHROME MASK FOR 0.5 MU-M CONTACT HOLE FABRICATION
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LOONG, WA; SHY, SL; GUO, GC; YANG, MT; SU, SY |
| 國立交通大學 |
2014-12-08T15:03:33Z |
0.35-MU-M PATTERN FABRICATION USING QUARTZ-ETCH ATTENUATE PHASE-SHIFTING MASK IN AN I-LINE STEPPER WITH A 0.50-NA AND A 0.60-SIGMA
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LOONG, WA; SHY, SL; LIN, YC |
| 國立交通大學 |
2014-12-08T15:02:59Z |
TiNx as a new embedded material for attenuated phase shift mask
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Loong, WA; Chen, TC; Tseng, JC |
| 國立交通大學 |
2014-12-08T15:02:03Z |
Study on optimization of annular off-axis illumination using Taguchi method for 0.35 mu m dense line/space
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Loong, WA; Tseng, JC; Chen, TC; Lung, CA |
顯示項目 21-32 / 32 (共2頁)
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每頁顯示[10|25|50]項目
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