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Taiwan Academic Institutional Repository >
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"loong wa"
Showing items 1-10 of 32 (4 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:49:17Z |
TiSixOy as an absorptive shifter for embedded phase-shifting mask in 248 nm and the modification of R-T method for the determination of shifter's n and k
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Loong, WA; Chen, CW; Chang, YH; Lin, CM; Cui, Z; Lung, CA |
| 國立交通大學 |
2014-12-08T15:46:39Z |
TiSixNy and TiSixOyNz as embedded materials for attenuated phase-shifting mask in 193 nm
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Lin, CM; Loong, WA |
| 國立交通大學 |
2014-12-08T15:45:15Z |
AlSixNy as an embedded layer for attenuated phase-shifting mask in 193 nm and the utilization of a chemically amplified negative resist NEB-22 for maskmaking
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Loong, WA; Lin, CM |
| 國立交通大學 |
2014-12-08T15:44:44Z |
Correlation between the chemical compositions and optical properties of AlSixNy embedded layer for attenuated phase-shifting mask in 193 nm and the modification of the R-T method for measuring n and k
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Lin, CM; Loong, WA |
| 國立交通大學 |
2014-12-08T15:44:36Z |
AlSixOy as a high-transmittance embedded material of ternary attenuated phase-shifting mask and correlation between chemical composition and optical properties of AlSixOy in 193 nm lithography
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Lin, CM; Loong, WA |
| 國立交通大學 |
2014-12-08T15:43:29Z |
The simulation of application of high transmittance AttPSM for sub-100 nm pattern in 248 nm lithography
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Lin, CM; Loong, WA |
| 國立交通大學 |
2014-12-08T15:43:29Z |
The correlation between the chemical compositions and optical properties of TiSixNy as an embedded layer for AttPSM in 193 nm
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Loong, WA; Lin, CM; Tseng, SP; Yeh, WL |
| 國立交通大學 |
2014-12-08T15:42:22Z |
Chemical stability of embedded material for attenuated phase-shifting mask and application of high-transmittance attenuated phase-shifting mask for 0.1 mu m contact pattern in 193 nm lithography
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Lin, CM; Loong, WA |
| 國立交通大學 |
2014-12-08T15:27:54Z |
SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIM
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LOONG, WA; SHY, SL; GUO, GC; CHOU, YL |
| 國立交通大學 |
2014-12-08T15:27:43Z |
SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM
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LOONG, WA; YEH, CH; SHY, SL |
Showing items 1-10 of 32 (4 Page(s) Totally)
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