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| 國立交通大學 |
2019-04-02T06:04:29Z |
Reliability Improvement of HfO2/SiON Gate Stacked nMOSFET using Fluorinated Silicate Glass Passivation Layer
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Hsieh, Chih-Ren; Chen, Yung-Yu; Chung, Jer-Fu; Lou, Jen-Chung |
| 國立交通大學 |
2019-04-02T05:58:18Z |
Effect of fluorinated silicate glass passivation layer on electrical characteristics and dielectric reliabilities for the HfO2/SiON gate stacked nMOSFET
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Hsieh, Chih-Ren; Chen, Yung-Yu; Lou, Jen-Chung |
| 國立交通大學 |
2018-08-21T05:52:56Z |
Endurance improvement and resistance stabilization of transparent multilayer resistance switching devices with oxygen deficient WOx layer and heat dissipating AlN buffer layer
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Lin, Yu-Hsuan; Huang, Ding-Chiuan; Lou, Jen-Chung; Tseng, Tseung-Yuen |
| 國立交通大學 |
2017-04-21T06:56:31Z |
Resistive Switching Mechanism of Oxygen-Rich Indium Tin Oxide Resistance Random Access Memory
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Tsai, Tsung-Ming; Chang, Kuan-Chang; Chang, Ting-Chang; Zhang, Rui; Wang, Tong; Pan, Chih-Hung; Chen, Kai-Huang; Chen, Hua-Mao; Chen, Min-Chen; Tseng, Yi-Ting; Chen, Po-Hsun; Lo, Ikai; Zheng, Jin-Cheng; Lou, Jen-Chung; Sze, Simon M. |
| 國立交通大學 |
2017-04-21T06:49:39Z |
HfO2 Inter-Poly Dielectric Characteristics with Interface Fluorine Passivation
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Chen, Yung-Yu; Hsieh, Chih-Ren; Lu, Kwung-Wen; Lou, Jen-Chung |
| 大葉大學 |
2016-06 |
Low Cost Local Contact Opening by Using Polystyrene Spheres Spin-Coating Method for PERC Solar Cells
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Hsu, Chia-Hsun;Yang, Chih-Hsiang;Wang, Yi-Han;Huang, Chun-Wei;Lien, Shui-Yang;Kung, Chung-Yuan;Lou, Jen-Chung |
| 國立成功大學 |
2016-04 |
Resistive Switching Mechanism of Oxygen-Rich Indium Tin Oxide Resistance Random Access Memory
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Tsai, Tsung-Ming; Chang, Kuan-Chang; Chang, Ting-Chang; Zhang, Rui; Wang, Tong; Pan, Chih-Hung; Chen, Kai-Huang; Chen, Hua-Mao; Chen, Min-Chen; Tseng, Yi-Ting; Chen, Po-Hsun; Lo, Ikai; Zheng, Jin-Cheng; Lou, Jen-Chung; Sze, Simon M. |
| 國立交通大學 |
2015-12-02T02:59:35Z |
Nitrogen Buffering Effect on Oxygen in Indium-Tin-Oxide-Capped Resistive Random Access Memory With NH3 Treatment
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Chen, Ji; Chang, Kuan-Chang; Chang, Ting-Chang; Tsai, Tsung-Ming; Pan, Chih-Hung; Zhang, Rui; Lou, Jen-Chung; Chu, Tian-Jian; Wu, Cheng-Hsien; Chen, Min-Chen; Hung, Ya-Chi; Syu, Yong-En; Zheng, Jin-Cheng; Sze, Simon M. |
| 國立交通大學 |
2015-11-26T01:05:23Z |
氟摻雜對應變矽於二氧化鉿堆疊式金氧半場效電晶體其特性和可靠度的影響
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邱芳毓; Chiu, Fang-Yu; 羅正忠; Lou, Jen-Chung |
| 國立成功大學 |
2015-11 |
Nitrogen Buffering Effect on Oxygen in Indium-Tin-Oxide-Capped Resistive Random Access Memory With NH3 Treatment
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Chen, Ji; Chang, Kuan-Chang; Chang, Ting-Chang; Tsai, Tsung-Ming; Pan, Chih-Hung; Zhang, Rui; Lou, Jen-Chung; Chu, Tian-Jian; Wu, Cheng-Hsien; Chen, Min-Chen; Hung, Ya-Chi; Syu, Yong-En; Zheng, Jin-Cheng; Sze, Simon M. |
| 國立交通大學 |
2014-12-13T10:51:28Z |
氟鈍化應用於次世代快閃記憶體之可靠度研究
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羅正忠; LOU JEN-CHUNG |
| 國立交通大學 |
2014-12-12T02:29:38Z |
以N自由基成長氮化矽閘極製程
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童樹進; Tung Su-Ching; 羅正忠; 林進燈; Lou Jen-chung; Lin Chin-Teng |
| 國立交通大學 |
2014-12-12T02:28:06Z |
快速升溫氧化成長超薄氧化層研究
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劉正淇; Liu Chen Chi; 羅正忠; Lou, Jen-Chung |
| 國立交通大學 |
2014-12-12T02:17:31Z |
閘極氧化層在電漿蝕刻中的損害研究
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江政隆; Jiang, Jane-Long; 羅正忠; Lou Jen-Chung |
| 國立交通大學 |
2014-12-12T02:17:23Z |
場效激發元件驅動器的設計
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魯得中; Luu, Der-Chung; 羅正忠; Lou Jen-Chung |
| 國立交通大學 |
2014-12-12T01:37:27Z |
氟應用於二氧化鉿儲存層非揮發性記憶體之研究
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林文新; Lin, Wen-Shin; 羅正忠; Lou, Jen-Chung |
| 國立交通大學 |
2014-12-12T01:37:17Z |
以低溫微波活化鍺薄膜摻雜之研究
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莊尚勳; Chuang, Shang-Shiun; 羅正忠; Lou, Jen-Chung |
| 國立交通大學 |
2014-12-12T01:27:28Z |
氟鈍化製程與氮氧化層於高介電常數金氧半場效應電晶體與快閃記憶體的特性研究
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謝智仁; Hsieh, Chih-Ren; 林國瑞; 羅正忠; Lin, Gray; Lou, Jen-Chung |
| 國立交通大學 |
2014-12-12T01:27:12Z |
氟化緩衝層應用於接觸孔蝕刻停止層局部形變矽金氧半場效電晶體鈍化層之特性與研究
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李翊裳; Li, Yi-Shang; 羅正忠; Lou, Jen-Chung |
| 國立交通大學 |
2014-12-12T01:27:06Z |
氟化製程應用於金氧半場效電晶體鈍化層之特性與研究
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莊哲輔; Chuang, Che-Fu; 羅正忠; Lou, Jen-Chung |
| 國立交通大學 |
2014-12-12T01:27:02Z |
臨場濕式氧化方法在金屬鎢奈米點非揮發性記憶體之製作與研究
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謝介銘; Hsieh, Chieh-Ming; 羅正忠; Lou, Jen-Chung |
| 國立交通大學 |
2014-12-12T01:21:11Z |
氟鈍化效應在高介電常數複晶矽層間介電層特性及可靠度研究
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陸冠文; Lu, Kuan-Wen; 羅正忠; Lou, Jen-Chung |
| 國立交通大學 |
2014-12-12T01:13:15Z |
氟掺雜濃度對於二氧化鉿堆疊式閘極P型金氧半場效電晶體其可靠性的影響
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謝岳展; Hsieh, Y.C.; 羅正忠; 邱碧秀; Lou, Jen-Chung; Chiou, Bi-Shiou |
| 國立交通大學 |
2014-12-08T15:47:54Z |
Effect of fluorinated silicate glass passivation layer on electrical characteristics and dielectric reliabilities for the HfO(2)/SiON gate stacked nMOSFET
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Hsieh, Chih-Ren; Chen, Yung-Yu; Lou, Jen-Chung |
| 國立交通大學 |
2014-12-08T15:47:38Z |
Characteristics of the Fluorinated High-k Inter-Poly Dielectrics
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Hsieh, Chih-Ren; Chen, Yung-Yu; Lu, Kwung-Wen; Lin, Gray; Lou, Jen-Chung |
Showing items 1-25 of 50 (2 Page(s) Totally)
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