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Showing items 1-10 of 14  (2 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:45:06Z Novel cleaning solutions for polysilicon film post chemical mechanical polishing Pan, TM; Lei, TF; Chen, CC; Chao, TS; Liaw, MC; Yang, WL; Tsai, MS; Lu, CP; Chang, WH
國立交通大學 2014-12-08T15:44:47Z Optimum conditions for novel one-step cleaning method for pre-gate oxide cleaning using robust design methodology Pan, TM; Lei, TF; Chao, TS; Liaw, MC; Lu, CP
國立交通大學 2014-12-08T15:43:54Z Investigations of effects of bias polarization and chemical parameters on morphology and filling capability of 130 nm damascene electroplated copper Chang, SC; Shieh, JM; Lin, KC; Dai, BT; Wang, TC; Chen, CF; Feng, MS; Li, YH; Lu, CP
國立交通大學 2014-12-08T15:43:50Z One-step cleaning solution to replace the conventional RCA two-step cleaning recipe for pregate oxide cleaning Pan, TM; Lei, TF; Chao, TS; Liaw, MC; Ko, FH; Lu, CP
國立交通大學 2014-12-08T15:43:18Z Comparison of novel cleaning solutions, with various chelating agents for post-CMP cleaning on poly-Si film Pan, TM; Lei, TF; Ko, FH; Chao, TS; Chiu, TH; Lee, YH; Lu, CP
國立交通大學 2014-12-08T15:42:23Z Performance evaluation of cleaning solutions enhanced with tetraalkylammonium hydroxide substituents for post-CMP cleaning on poly-Si film Pan, TM; Lei, TF; Ko, FH; Chao, TS; Liaw, MC; Lee, YH; Lu, CP
國立交通大學 2014-12-08T15:42:14Z Wetting effect on gap filling submicron damascene by an electrolyte free of levelers Chang, SC; Shieh, JM; Lin, KC; Dai, BT; Wang, TC; Chen, CF; Feng, MS; Li, YH; Lu, CP
國立交通大學 2014-12-08T15:38:47Z Novel one-step aqueous solutions to replace pregate oxide cleans Pan, TM; Lei, TF; Ko, FH; Chao, TS; Chin, TH; Lu, CP
國立臺灣海洋大學 2013 Methodological streamlining of SNP discovery and genotyping via high-resolution melting analysis (HRMA) in non-model species. Smith BL; Alvarado Bremer JR; Lu CP
國立臺灣海洋大學 2010 High-resolution melting analysis (HRMA): a highly sensitive inexpensive genotyping alternative for population studies. Smith BL; Lu CP; Alvarado Bremer JR

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