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Institution Date Title Author
國立交通大學 2015-11-26T00:57:08Z 利用多層堆疊氧化鉿/氧化鑭為閘極絕緣層以提升增強型氮化鎵金屬-絕緣體-半導體高電子遷移率電晶體起始電壓之穩定性 黃裕翔; Huang, Yu-Xiang; 張翼; 馬哲申; Chang, Yi; Ma, Jhe-Shen

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