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Showing items 1-11 of 11 (1 Page(s) Totally)
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| 國立成功大學 |
2011-06 |
Characteristics of Si/SiO(2) Interface Properties for CMOS Fabricated on Hybrid Orientation Substrate Using Amorphization/Templated Recrystallization (ATR) Method
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Huang, Po Chin; Wu, San Lein; Chang, Shoou Jinn; Huang, Yao Tsung; Chen, Jone F.; Lin, Chien Ting; Ma, Mike; Cheng, Osbert |
| 國立成功大學 |
2011-03-15 |
Effect of annealing time on Si/SiO(2) interface property for CMOS fabricated on hybrid orientation substrate with ATR method
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Huang, Po Chin; Wu, San Lein; Chang, Shoou Jinn; Huang, Yao Tsung; Lin, Chien Ting; Ma, Mike; Cheng, Osbert |
| 國立高雄大學 |
2008-10 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
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Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2008-09-01 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
|
Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
| 國立高雄大學 |
2008 |
The impact of stain technology on FUSI gate SOI CMOSFET and device performance enhancement for 45nm node and beyond
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Yeh, Wen-Kuan; Wang, Jean-An; Lin, Chien-Ting; Cheng, Li-Wei; Ma, Mike |
| 國立臺灣大學 |
2008 |
Shallow-Trench-Isolation (STI)-Induced Mechanical-Stress-Related Kink-Effect Behaviors of 40-nm PD SOI NMOS Device
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Su, V. C.; Kuo, James B.; Lin, I. S.; Lin, Guan-Shyan; Chen, David C.; Yeh, Chune-Sin; Tsai, Cheng-Tzung; Ma, Mike |
| 國立成功大學 |
2007-09 |
CMOS dual-work-function engineering by using implanted Ni-FUSI
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Lin, Chien-Ting; Ramin, Manfred; Pas, Michael; Wise, Rick; Fang, Yean-Kuen; Hsu, Che-Hua; Huang, Yao-Tsung; Cheng, Li-Wei; Ma, Mike |
| 國立高雄大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2006-12 |
Effect of silicon thickness on contact-etch-stop-layer-induced silicon/buried-oxide interface stress for partially depleted SOI
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2006-04 |
Investigation and modeling of stress interactions on 90 nm silicon on insulator complementary metal oxide semiconductor by various mobility enhancement approaches
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Hing; Hsu, Che-Hua; Chen, Liang-Wei; Chang, Hui-Chen; Tsai, Cheng-Tzung; Ma, Mike |
Showing items 1-11 of 11 (1 Page(s) Totally)
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