English  |  正體中文  |  简体中文  |  總筆數 :0  
造訪人次 :  51986724    線上人數 :  850
教育部委託研究計畫      計畫執行:國立臺灣大學圖書館
 
臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
關於TAIR

瀏覽

消息

著作權

相關連結

"ma ming wen"的相關文件

回到依作者瀏覽
依題名排序 依日期排序

顯示項目 6-15 / 33 (共4頁)
1 2 3 4 > >>
每頁顯示[10|25|50]項目

機構 日期 題名 作者
國立交通大學 2014-12-08T15:16:43Z A highly reliable multi-level and 2-bit/cell operation of wrapped-select-gate (WSG) SONOS memory with optimized ONO thickness Wu, Woei-Cherng; Chao, Tien-Sheng; Peng, Wu-Chin; Yang, Wen-Luh; Wang, Jer-Chyi; Chen, Jian-Hao; Ma, Ming-Wen; Lai, Chao-Sung; Yang, Tsung-Yu; Chen, Tzu-Ping; Chen, Chien-Hung; Lin, Chih-Hung; Chen, Hwi-Huang; Ko, Joe
國立交通大學 2014-12-08T15:15:57Z Fringing electric field effect on 65-nm-node fully depleted silicon-on-insulator devices Ma, Ming-Wen; Chao, Tien-Sheng; Kao, Kuo-Hsing; Huang, Jyun-Siang; Lei, Tan-Fu
國立交通大學 2014-12-08T15:15:32Z High-kappa material sidewall with source/drain-to-gate non-overlapped structure for low standby power applications Ma, Ming-Wen; Chao, Tien-Sheng; Kao, Kuo-Hsing; Huang, Jyun-Siang; Lei, Tan-Fu
國立交通大學 2014-12-08T15:15:06Z Bias temperature instabilities for low-temperature polycrystalline silicon complementary thin-film transistors Chen, Chih-Yang; Lee, Jam-Wem; Ma, Ming-Wen; Chen, Wei-Cheng; Lin, Hsiao-Yi; Yeh, Kuan-Lin; Wang, Shen-De; Lei, Tan-Fu
國立交通大學 2014-12-08T15:15:05Z High-performance HfO2 gate dielectrics fluorinated by postdeposition CF4 plasma treatment Wu, Woei Cherng; Lai, Chao Sung; Wang, Jer Chyi; Chen, Jian Hao; Ma, Ming Wen; Chao, Tien Sheng
國立交通大學 2014-12-08T15:14:34Z Impact of high-k offset spacer in 65-nm node SOI devices Ma, Ming-Wen; Wu, Chien-Hung; Yang, Tsung-Yu; Kao, Kuo-Hsing; Wu, Woei-Cherng; Wang, Shui-Jinn; Chao, Tien-Sheng; Lei, Tan-Fu
國立交通大學 2014-12-08T15:14:11Z A reliability model for low-temperature polycrystalline silicon thin-film transistors Chen, Chih-Yang; Lee, Jam-Wem; Lee, Po-Hao; Chen, Wei-Cheng; Lin, Hsiao-Yi; Yeh, Kuan-Lin; Ma, Ming-Wen; Wang, Shen-De; Lei, Tan-Fu
國立交通大學 2014-12-08T15:12:56Z Performance and interface characterization for contact etch stop layer-strained nMOSFET with HfO2 gate dielectrics under pulsed-IV measurement Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng
國立交通大學 2014-12-08T15:12:55Z Optimized ONO thickness for multi-level and 2-bit/cell operation for wrapped-select-gate (WSG) SONOS memory Wu, Woei-Cherng; Chao, Tien-Sheng; Peng, Wu-Chin; Yang, Wen-Luh; Chen, Jian-Hao; Ma, Ming Wen; Lai, Chao-Sung; Yang, Tsung-Yu; Lee, Chien-Hsing; Hsieh, Tsung-Min; Liou, Jhyy Cheng; Chen, Tzu Ping; Chen, Chien Hung; Lin, Chih Hung; Chen, Hwi Huang; Ko, Joe
國立交通大學 2014-12-08T15:12:52Z Current transport mechanism for HfO2 gate dielectrics with fluorine incorporation Wu, Woei Cherng; Lai, Chao Sung; Wang, Tzu Ming; Wang, Jer Chyi; Hsu, Chih Wei; Ma, Ming Wen; Chao, Tien Sheng

顯示項目 6-15 / 33 (共4頁)
1 2 3 4 > >>
每頁顯示[10|25|50]項目