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Showing items 26-33 of 33  (4 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:10:43Z Impacts of N-2 and NH3 Plasma Surface Treatments on High-Performance LTPS-TFT With High-kappa Gate Dielectric Ma, Ming-Wen; Chao, Tien-Sheng; Chiang, Tsung-Yu; Wu, Woei-Cherng; Lei, Tan-Fu
國立交通大學 2014-12-08T15:10:35Z Positive Bias Temperature Instability (PBTI) Characteristics of Contact-Etch-Stop-Layer-Induced Local-Tensile-Strained HfO(2) nMOSFET Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng
國立交通大學 2014-12-08T15:10:33Z Characteristics of HfO(2)/Poly-Si Interfacial Layer on CMOS LTPS-TFTs With HfO(2) Gate Dielectric and O(2) Plasma Surface Treatment Ma, Ming-Wen; Chiang, Tsung-Yu; Wu, Woei-Cherng; Chao, Tien-Sheng; Lei, Tan-Fu
國立交通大學 2014-12-08T15:10:28Z Electrical Characteristics of High Performance SPC and MILC p-Channel LTPS-TFT with High-kappa Gate Dielectric Ma, Ming-Wen; Chiang, Tsung-Yu; Yeh, Chi-Ruei; Chao, Tien-Sheng; Lei, Tan-Fu
國立交通大學 2014-12-08T15:09:16Z High-performance p-channel LTPS-TFT using HfO(2) gate dielectric and nitrogen ion implantation Ma, Ming-Wen; Chiang, Tsung-Yu; Chao, Tien-Sheng; Lei, Tan-Fu
國立交通大學 2014-12-08T15:08:49Z MILC-TFT With High-kappa Dielectrics for One-Time-Programmable Memory Application Chiang, Tsung-Yu; Ma, Ming-Wen; Wu, Yi-Hong; Kuo, Po-Yi; Wang, Kuan-Ti; Liao, Chia-Chun; Yeh, Chi-Ruei; Chao, Tien-Sheng
國立交通大學 2014-12-08T15:07:34Z Performance enhancement for strained HfO(2) nMOSFET with contact etch stop layer (CESL) under pulsed-IV measurement Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng; Ho, Yi-Hsun
國立成功大學 2007-03 Impact of high-k offset spacer in 65-nm node SOI devices Ma, Ming-Wen; Wu, Chien-Hung; Yang, Tsung-Yu; Kao, Kuo-Hsing; Wu, Woei-Cherng; Wang, Shui-Jinn; Chao, Tien-Sheng; Lei, Tan-Fu

Showing items 26-33 of 33  (4 Page(s) Totally)
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