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| 大葉大學 |
2017-05-8 |
Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
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XIAOYING, ZHANG;Hsu, Chia-Hsun;Lien, Shui-Yang;Chen, Song-Yan;Huang, Wei;Yang, Chih-Hsiang;Kung, Chung-Yuan;Zhu, Wen-Zhang;Xiong, Fei-Bing;Meng, Xian-Guo |
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