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"ng p c w"的相关文件
显示项目 1-7 / 7 (共1页)
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| 臺大學術典藏 |
2020-06-16T06:34:48Z |
Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence
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Su, Y.-S.;Ng, P.C.W.;Tsai, K.-Y.;Chen, Y.-Y.; Su, Y.-S.; Ng, P.C.W.; Tsai, K.-Y.; Chen, Y.-Y.; KUEN-YU TSAI |
| 臺大學術典藏 |
2020-01-17T07:45:18Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
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Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Pei, T.-H.; Wang, F.-M.; Li, J.-H.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
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Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method
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Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:16Z |
Erratum: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects (Journal of Micro/ Nanolithography, MEMS, and MOEMS (2011) 10 (013004))
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Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:16Z |
Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
|
Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:13Z |
Direct-scatterometry-enabled optical-proximity-correction-model calibration
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JIA-HAN LI; Chen, A.C.; Shieh, J.J.; Li, J.-H.; Tsai, K.-Y.; Shen, Y.-T.; Liu, C.-H.; Ng, P.C.W.; Chen, C.-Y. |
显示项目 1-7 / 7 (共1页)
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