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"pan fm"的相關文件
顯示項目 11-20 / 49 (共5頁)
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| 國立交通大學 |
2014-12-08T15:43:18Z |
Cu contamination effect in oxynitride gate dielectrics
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Lin, YH; Pan, FM; Liao, YC; Chen, YC; Hsieh, IJ; Chin, A |
| 國立交通大學 |
2014-12-08T15:42:46Z |
Effective strategy for porous organosilicate to suppress oxygen ashing damage
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Liu, PT; Chang, TC; Mor, YS; Chen, CW; Tsai, TM; Chu, CJ; Pan, FM; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:32Z |
Preventing dielectric damage of low-k organic siloxane by passivation treatment
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Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:15Z |
Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatment
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Chang, TC; Liu, PT; Mor, YS; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:14Z |
Effective repair to ultra-low-k dielectric material (k-2.0) by hexamethyidisilazane treatment
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Mor, YS; Chang, TC; Liu, PT; Tsai, TM; Chen, CW; Yan, ST; Chu, CJ; Wu, WF; Pan, FM; Lur, W; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:06Z |
Observation of differential capacitance images on slightly iron-contaminated p-type silicon
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Chang, MN; Chen, CY; Pan, FM; Chang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:41:53Z |
Trimethylchlorosilane treatment of ultralow dielectric constant material after photoresist removal processing
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Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Chu, CJ; Pan, FM; Lur, W; Sze, SM |
| 國立交通大學 |
2014-12-08T15:41:02Z |
Self-organized titanium oxide nanodot arrays by electrochemical anodization
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Chen, PL; Kuo, CT; Tsai, TG; Wu, BW; Hsu, CC; Pan, FM |
| 國立交通大學 |
2014-12-08T15:40:49Z |
Microstructure and mechanical properties of surfactant templated nanoporous silica thin films: Effect of methylsilylation
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Chen, JY; Pan, FM; Cho, AT; Chao, KJ; Tsai, TG; Wu, BW; Yang, CM; Chang, L |
| 國立交通大學 |
2014-12-08T15:39:50Z |
Selective growth of carbon nanotube on scanning probe tips by microwave plasma chemical vapor deposition
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Pan, FM; Liu, YB; Chang, Y; Chen, CY; Tsai, TG; Chang, MN; Sheu, JT |
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