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Showing items 11-35 of 49 (2 Page(s) Totally) 1 2 > >> View [10|25|50] records per page
| 國立交通大學 |
2014-12-08T15:43:18Z |
Cu contamination effect in oxynitride gate dielectrics
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Lin, YH; Pan, FM; Liao, YC; Chen, YC; Hsieh, IJ; Chin, A |
| 國立交通大學 |
2014-12-08T15:42:46Z |
Effective strategy for porous organosilicate to suppress oxygen ashing damage
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Liu, PT; Chang, TC; Mor, YS; Chen, CW; Tsai, TM; Chu, CJ; Pan, FM; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:32Z |
Preventing dielectric damage of low-k organic siloxane by passivation treatment
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Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:15Z |
Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatment
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Chang, TC; Liu, PT; Mor, YS; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:14Z |
Effective repair to ultra-low-k dielectric material (k-2.0) by hexamethyidisilazane treatment
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Mor, YS; Chang, TC; Liu, PT; Tsai, TM; Chen, CW; Yan, ST; Chu, CJ; Wu, WF; Pan, FM; Lur, W; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:06Z |
Observation of differential capacitance images on slightly iron-contaminated p-type silicon
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Chang, MN; Chen, CY; Pan, FM; Chang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:41:53Z |
Trimethylchlorosilane treatment of ultralow dielectric constant material after photoresist removal processing
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Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Chu, CJ; Pan, FM; Lur, W; Sze, SM |
| 國立交通大學 |
2014-12-08T15:41:02Z |
Self-organized titanium oxide nanodot arrays by electrochemical anodization
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Chen, PL; Kuo, CT; Tsai, TG; Wu, BW; Hsu, CC; Pan, FM |
| 國立交通大學 |
2014-12-08T15:40:49Z |
Microstructure and mechanical properties of surfactant templated nanoporous silica thin films: Effect of methylsilylation
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Chen, JY; Pan, FM; Cho, AT; Chao, KJ; Tsai, TG; Wu, BW; Yang, CM; Chang, L |
| 國立交通大學 |
2014-12-08T15:39:50Z |
Selective growth of carbon nanotube on scanning probe tips by microwave plasma chemical vapor deposition
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Pan, FM; Liu, YB; Chang, Y; Chen, CY; Tsai, TG; Chang, MN; Sheu, JT |
| 國立交通大學 |
2014-12-08T15:39:46Z |
Stable blue luminescence from mesoporous silica films
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Shieh, JM; Cho, AT; Lai, YF; Dai, BT; Pan, FM; Chao, KJ |
| 國立交通大學 |
2014-12-08T15:39:46Z |
Influence of annealing sequence on p(+)/n junction images studied by scanning capacitance microscopy
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Chang, MN; Wan, WW; Chen, CY; Lai, JH; Liang, JH; Pan, FM |
| 國立交通大學 |
2014-12-08T15:39:16Z |
Alkylation of nanoporous silica thin films by high density plasma chemical vapor deposition of a-SIC : H
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Pan, FM; Wu, BW; Cho, AT; Tsai, KC; Tsai, TG; Chao, KJ; Chen, JY; Chang, L |
| 國立交通大學 |
2014-12-08T15:39:11Z |
Preparation and phase transformation of highly ordered TiO2 nanodot arrays on sapphire substrates
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Chen, PL; Kuo, CT; Pan, FM; Tsai, TG |
| 國立交通大學 |
2014-12-08T15:37:25Z |
Anodic aluminum oxide template assisted growth of vertically aligned carbon nanotube arrays by ECR-CVD
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Chen, PL; Chang, JK; Kuo, CT; Pan, FM |
| 國立交通大學 |
2014-12-08T15:37:07Z |
Fabrication and field emission characteristics of highly ordered titanium oxide nanodot arrays
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Chen, PL; Huang, WJ; Chang, JK; Kuo, CT; Pan, FM |
| 國立交通大學 |
2014-12-08T15:36:01Z |
Emission of bright blue light from mesoporous silica with dense Si (Ge) nanocrystals
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Cho, AT; Shieh, JM; Shieh, J; Lai, YF; Dai, BT; Pan, FM; Kuo, HC; Lin, YC; Chao, KJ; Liu, PH |
| 國立交通大學 |
2014-12-08T15:27:44Z |
Study of Schottky barriers on n-type GaN grown by LP-MOCVD
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Guo, JD; Feng, MS; Pan, FM |
| 國立交通大學 |
2014-12-08T15:27:38Z |
Thermal stability and interaction between SiOF and Cu film
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Mei, YJ; Chang, TC; Sheu, JD; Yeh, WK; Pan, FM; Chang, CY |
| 國立交通大學 |
2014-12-08T15:27:37Z |
Anomalous selective tungsten growth by chemical vapor deposition
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Mei, YJ; Chang, TC; Sheu, JD; Yeh, WK; Pan, FM; Chang, CY |
| 國立交通大學 |
2014-12-08T15:19:40Z |
Tube number density control of carbon nanotubes on anodic aluminum oxide template
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Chen, PL; Chang, JK; Pan, FM; Kuo, CT |
| 國立交通大學 |
2014-12-08T15:19:30Z |
Field emission of carbon nanotubes on anodic aluminum oxide template with controlled tube density
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Chen, PL; Chang, JK; Kuo, CT; Pan, FM |
| 國立交通大學 |
2014-12-08T15:18:48Z |
The preparation of mesoporous silica ultra-low-k film using ozone ashing treatment
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Cho, AT; Pan, FM; Chao, KJ; Liu, PH; Chen, JY |
| 國立交通大學 |
2014-12-08T15:18:31Z |
Thermal stability of trimethylsilylated mesoporous silica thin films as the ultralow-k dielectric for copper interconnects
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Chen, JY; Pan, FM; Chang, L; Cho, AT; Chao, KJ |
| 國立交通大學 |
2014-12-08T15:17:44Z |
Effect of trimethylsilylation on the film stress of mesoporous silica ultralow-k film stacks
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Chen, JY; Pan, FM; Lin, DX; Cho, AT; Chao, KJ; Chang, L |
Showing items 11-35 of 49 (2 Page(s) Totally) 1 2 > >> View [10|25|50] records per page
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