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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
國立交通大學 2014-12-08T15:46:11Z The novel improvement of low dielectric constant methylsilsesquioxane by N2O plasma treatment Chang, TC; Liu, PT; Mor, YS; Sze, SM; Yang, YL; Feng, MS; Pan, FM; Dai, BT; Chang, CY
國立交通大學 2014-12-08T15:45:53Z Annealing effects on the interfacial reactions of Ni on Si0.76Ge0.24 and Si1-x-yGexCy Luo, JS; Lin, WT; Chang, CY; Shih, PS; Pan, FM
國立交通大學 2014-12-08T15:44:42Z The effect of copper on gate oxide integrity Lin, YH; Wu, YH; Chin, A; Pan, FM
國立交通大學 2014-12-08T15:43:59Z The strong degradation of 30 angstrom gate oxide integrity contaminated by copper Lin, YH; Chen, YC; Chan, KT; Pan, FM; Hsieh, IJ; Chin, A
國立交通大學 2014-12-08T15:43:27Z An investigation of scanning capacitance microscopy on iron-contaminated p-type silicon Chang, MN; Chang, TY; Pan, FM; Wu, BW; Lei, TF
國立交通大學 2014-12-08T15:43:18Z Cu contamination effect in oxynitride gate dielectrics Lin, YH; Pan, FM; Liao, YC; Chen, YC; Hsieh, IJ; Chin, A
國立交通大學 2014-12-08T15:42:46Z Effective strategy for porous organosilicate to suppress oxygen ashing damage Liu, PT; Chang, TC; Mor, YS; Chen, CW; Tsai, TM; Chu, CJ; Pan, FM; Sze, SM
國立交通大學 2014-12-08T15:42:32Z Preventing dielectric damage of low-k organic siloxane by passivation treatment Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM
國立交通大學 2014-12-08T15:42:15Z Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatment Chang, TC; Liu, PT; Mor, YS; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM
國立交通大學 2014-12-08T15:42:14Z Effective repair to ultra-low-k dielectric material (k-2.0) by hexamethyidisilazane treatment Mor, YS; Chang, TC; Liu, PT; Tsai, TM; Chen, CW; Yan, ST; Chu, CJ; Wu, WF; Pan, FM; Lur, W; Sze, SM

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