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Institution Date Title Author
臺大學術典藏 2018-09-10T08:08:47Z Architecture for next generation massively parallel maskless lithography system (MPML2) Su, M.-S.;Tsai, K.-Y.;Lu, Y.-C.;Kuo, Y.-H.;Pei, T.-H.;Yen, J.-Y.; Su, M.-S.; Tsai, K.-Y.; Lu, Y.-C.; Kuo, Y.-H.; Pei, T.-H.; Yen, J.-Y.; YI-CHANG LU; KUEN-YU TSAI; JIA-YUSH YEN
臺大學術典藏 2018-09-10T07:36:10Z Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography Chen, S.-Y.;Tsai, K.-Y.;Ng, H.-T.;Fan, C.-H.;Pei, T.-H.;Kuan, C.-H.;Chen, Y.-Y.;Yen, J.-Y.; Chen, S.-Y.; Tsai, K.-Y.; Ng, H.-T.; Fan, C.-H.; Pei, T.-H.; Kuan, C.-H.; Chen, Y.-Y.; Yen, J.-Y.; CHIEH-HSIUNG KUAN; YUNG-YAW CHEN; KUEN-YU TSAI; JIA-YUSH YEN
臺大學術典藏 2018-09-10T07:36:10Z Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography Chen, S.-Y.;Tsai, K.-Y.;Ng, H.-T.;Fan, C.-H.;Pei, T.-H.;Kuan, C.-H.;Chen, Y.-Y.;Yen, J.-Y.; Chen, S.-Y.; Tsai, K.-Y.; Ng, H.-T.; Fan, C.-H.; Pei, T.-H.; Kuan, C.-H.; Chen, Y.-Y.; Yen, J.-Y.; CHIEH-HSIUNG KUAN; YUNG-YAW CHEN; KUEN-YU TSAI; JIA-YUSH YEN

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