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Institution Date Title Author
國立交通大學 2019-04-02T05:59:14Z Charging damages to gate oxides in a helicon O-2 plasma Lin, W; Kang, TK; Perng, YC; Dai, BT; Cheng, HC
國立交通大學 2014-12-08T15:49:04Z A novel two-step etching to suppress the charging damages during metal etching employing helicon wave plasma Cheng, HC; Lin, W; Kang, TK; Perng, YC; Dai, BT
國立交通大學 2014-12-08T15:48:55Z Effects of helicon-wave-plasma etching on the charging damage of aluminum interconnects Lin, W; Kang, TK; Perng, YC; Dai, BT; Cheng, HC
國立交通大學 2014-12-08T15:01:16Z Charging damages to gate oxides in a helicon O-2 plasma Lin, W; Kang, TK; Perng, YC; Dai, BT; Cheng, HC

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