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Showing items 1-4 of 4 (1 Page(s) Totally) 1 View [10|25|50] records per page
| 國立交通大學 |
2019-04-02T05:59:14Z |
Charging damages to gate oxides in a helicon O-2 plasma
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Lin, W; Kang, TK; Perng, YC; Dai, BT; Cheng, HC |
| 國立交通大學 |
2014-12-08T15:49:04Z |
A novel two-step etching to suppress the charging damages during metal etching employing helicon wave plasma
|
Cheng, HC; Lin, W; Kang, TK; Perng, YC; Dai, BT |
| 國立交通大學 |
2014-12-08T15:48:55Z |
Effects of helicon-wave-plasma etching on the charging damage of aluminum interconnects
|
Lin, W; Kang, TK; Perng, YC; Dai, BT; Cheng, HC |
| 國立交通大學 |
2014-12-08T15:01:16Z |
Charging damages to gate oxides in a helicon O-2 plasma
|
Lin, W; Kang, TK; Perng, YC; Dai, BT; Cheng, HC |
Showing items 1-4 of 4 (1 Page(s) Totally) 1 View [10|25|50] records per page
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