臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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显示项目 11-20 / 31 (共4页)
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机构	日期	题名	作者
臺大學術典藏	2018-09-10T08:46:33Z	Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects	Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:32Z	Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects	Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography	Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography	Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	A non-delta-chrome OPC methodology for nonlinear process models	Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	A non-delta-chrome OPC methodology for nonlinear process models	Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Model-based proximity effect correction for electron-beam direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏	2018-09-10T08:18:21Z	Model-based proximity effect correction for electron-beam direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏	2018-09-10T08:18:21Z	A non-delta-chrome OPC methodology for process models with three-dimensional mask effects	Philip C. W. Ng;Kuen-Yu Tsai;Chih-Hsien Tang;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Chih-Hsien Tang; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	A non-delta-chrome OPC methodology for process models with three-dimensional mask effects	Philip C. W. Ng;Kuen-Yu Tsai;Chih-Hsien Tang;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Chih-Hsien Tang; Lawrence S. Melvin III; KUEN-YU TSAI

显示项目 11-20 / 31 (共4页)
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