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Showing items 1-10 of 31  (4 Page(s) Totally)
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Institution Date Title Author
臺大學術典藏 2018-09-10T09:50:34Z Study of etching bias modeling and correction strategies for compensation of patterning process effects Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Study of etching bias modeling and correction strategies for compensation of patterning process effects Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Direct-scatterometry-enabled optical-proximity-correction-model calibration Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Direct-scatterometry-enabled optical-proximity-correction-model calibration Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:33Z Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:33Z Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:25:00Z New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:25:00Z New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:25:00Z Study of etching bias modeling and correction strategies for patterning processes Philip C.W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C.W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:25:00Z Study of etching bias modeling and correction strategies for patterning processes Philip C.W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C.W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI

Showing items 1-10 of 31  (4 Page(s) Totally)
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