臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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机构	日期	题名	作者
臺大學術典藏	2018-09-10T07:42:06Z	A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows	Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:08:40Z	A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects	Meng-Fu You; Yi-Chang Lu; Philip C. W. Ng; YI-CHANG LU; KUEN-YU TSAI; Kuen-Yu Tsai;Meng-Fu You;Yi-Chang Lu;Philip C. W. Ng; Kuen-Yu Tsai
臺大學術典藏	2018-09-10T07:08:40Z	A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects	Meng-Fu You; Yi-Chang Lu; Philip C. W. Ng; YI-CHANG LU; KUEN-YU TSAI; Kuen-Yu Tsai;Meng-Fu You;Yi-Chang Lu;Philip C. W. Ng; Kuen-Yu Tsai
臺大學術典藏	2018-09-10T07:08:40Z	A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography	Chun-Hung Liu;Hoi-Tou Ng;Philip C. W. Ng;Kuen-Yu Tsai;Shy-Jay Lin;Jeng-Horng Chen; Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:08:40Z	A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography	Chun-Hung Liu;Hoi-Tou Ng;Philip C. W. Ng;Kuen-Yu Tsai;Shy-Jay Lin;Jeng-Horng Chen; Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T06:35:25Z	Impacts of optical proximity correction settings on electrical performances	Meng-Fu You; Philip C. W. Ng; Yi-Sheng Su; Kuen-Yu Tsai; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI

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