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Institution	Date	Title	Author
國立成功大學	2024-08	Study of Endurance Performance of SiO2 Interfacial Layer Scaling Through O Scavenging in Si Channel n-FeFET With Si:HfO2 Ferroelectric Layer	Agarwal;A;Walke;A, M.;Ronchi;N;Kao;K, -H.;Houdt, Van;J

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