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机构 日期 题名 作者
臺大學術典藏 2021-08-05T02:41:49Z Device pattern impact on optical endpoint detection by interferometry for STI CMP Bourzgui S;Roussy A;Blue J;Georges G;Faivre E;Labory K;Allard A.; Bourzgui S; Roussy A; Blue J; Georges G; Faivre E; Labory K; Allard A.; JAKEY BLUE
臺大學術典藏 2020-03-02T06:40:10Z Efficient FDC based on hierarchical tool condition monitoring scheme Blue, J.; Roussy, A.; Thieullen, A.; Pinaton, J.; JAKEY BLUE
臺大學術典藏 2020-03-02T06:40:09Z Run-To-Run sensor variation monitoring for process fault diagnosis in semiconductor manufacturing Blue, J.; Roussy, A.; Pinaton, J.; JAKEY BLUE
臺大學術典藏 2020-03-02T06:40:09Z FDC R2R variation monitoring for sensor level diagnosis in tool condition hierarchy Blue, J.; Roussy, A.; Pinaton, J.; JAKEY BLUE
臺大學術典藏 2020-03-02T06:40:08Z The light behavior from shallow trench isolation profiles at chemical mechanical planarization step and correlation with optical endpoint system by interferometry Bourzgui, S.; Georges, G.; Roussy, A.; Blue, J.; Faivre, E.; Pinaton, J.; JAKEY BLUE
臺大學術典藏 2020-03-02T06:40:08Z Key Effects and Process Parameters Extraction on the CD of Reactive Ion Etching (RIE) Based on DOE Modeling Rizquez, M.; Roussy, A.; Blue, J.; Bucelle, L.; Pinaton, J.; Pasquet, J.; JAKEY BLUE
臺大學術典藏 2020-03-02T06:40:07Z Advanced run-to-run controller in semiconductor manufacturing with real-time equipment condition: APC: Advanced process control; AM: Advanced metrology Yang, W.-T.; Blue, J.; Roussy, A.; Reis, M.; Pinaton, J.; JAKEY BLUE
臺大學術典藏 2020-03-02T06:40:06Z Virtual metrology modeling based on Gaussian Bayesian network Yang, W.-T.; Blue, J.; Roussy, A.; Reis, M.S.; Pinaton, J.; JAKEY BLUE
臺大學術典藏 2013 Tool condition diagnosis with a recipe-independent hierarchical monitoring scheme Blue, J.; Gleispach, D.; Roussy, A.; Scheibelhofer, P.; JAKEY BLUE

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