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Showing items 1-9 of 9 (1 Page(s) Totally)
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| 臺大學術典藏 |
2021-11-03T01:38:41Z |
Highly Emissive Dinuclear Platinum(III) Complexes
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Wu, XG; Chen, DG; Liu, DH; Liu, SH; Shen, SW; Wu, CI; Xie, GH; Zhou, JW; Huang, ZX; Huang, CY; Su, SJ; Zhu, WG; Chou, PT; PI-TAI CHOU |
| 臺大學術典藏 |
2021-11-03T01:38:40Z |
Delayed Charge Recombination by Open-Shell Organics: Its Application in Achieving Superb Photodetectors with Broadband (400-1160 nm) Ultrahigh Sensitivity and Stability
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Shen, SW; Chen, DG; Chen, IT; Chang, KH; Lee, CW; Fang, CT; Chen, YT; Chuang, WT; Lee, YH; Wu, YT; Chou, PT; Wu, CI; PI-TAI CHOU |
| 臺大學術典藏 |
2021-11-03T01:38:36Z |
Interlayer Charge Transfer Coupled with Acoustic Phonon in Organic/Inorganic van der Waals Stacked Heterostructures: Self-Assembled Pt(II) Complex on a PtSe2 Monolayer
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Shen, SW; Wei, YC; Fu, FY; Chou, KJ; Wang, SF; Fu, LW; Chuang, WT; Tsai, ML; Chen, MH; Chi, Y; Chou, PT; Wu, CI; PI-TAI CHOU |
| 臺大學術典藏 |
2021-11-03T01:38:35Z |
Through-Space Exciton Delocalization in Segregated HJ-Crystalline Molecular Aggregates
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Wei, YC; Shen, SW; Wu, CH; Ho, SY; Zhang, ZY; Wu, CI; Chou, PT; PI-TAI CHOU |
| 國立交通大學 |
2019-04-02T06:00:18Z |
Improvements on electrical characteristics of p-channel metal-oxide-semiconductor field effect transistors with HfO2 gate stacks by post deposition N2O plasma treatment
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Lu, WT; Chien, CH; Lan, WT; Lee, TC; Yang, MJ; Shen, SW; Lehnen, P; Huang, TY |
| 國立交通大學 |
2014-12-08T15:36:00Z |
Low-temperature growth of polycrystalline ge films on SiO2 substrate by HDPCVD
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Yang, MJ; Shieh, J; Hsu, SL; Huang, IJ; Leu, CC; Shen, SW; Huang, TY; Lehnen, P; Chien, CH |
| 國立交通大學 |
2014-12-08T15:25:43Z |
A novel methodology for extracting effective density-of-states in poly-Si thin-film transistors
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Lin, HC; Yeh, KL; Lee, MH; Su, YC; Huang, TY; Shen, SW; Lin, HY |
| 國立交通大學 |
2014-12-08T15:18:52Z |
Study of thermal stability of nickel monogermanide on single- and polycrystalline germanium substrates
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Hsu, SL; Chien, CH; Yang, MJ; Huang, RH; Leu, CC; Shen, SW; Yang, TH |
| 國立交通大學 |
2014-12-08T15:18:06Z |
Improvements on electrical characteristics of p-channel metal-oxide-semiconductor field effect transistors with HfO(2) gate stacks by post deposition N(2)O plasma treatment
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Lu, WT; Chien, CH; Lan, WT; Lee, TC; Yang, MJ; Shen, SW; Lehnen, P; Huang, TY |
Showing items 1-9 of 9 (1 Page(s) Totally)
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