臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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Institution	Date	Title	Author
臺大學術典藏	2022-01-03T08:01:17Z	Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system	Yen-Min Lee; Jia-Han Li*; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony Wen-Hann Sheu; Jia-Yush Yen; JIA-HAN LI
臺大學術典藏	2019-10-31T07:58:01Z	Fabrication of metrology test structures with helium ion beam direct write	KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI
臺大學術典藏	2019-10-31T07:58:00Z	Fabrication of metrology test structures with helium ion beam direct write	KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:26:03Z	Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Hsuan-Ping Lee;Sheng-Yung Chen;Chun-Hung Liu;Ding-Qi;Yu-Tian Shen;Kuen-Yu Tsai; Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi
臺大學術典藏	2018-09-10T15:00:25Z	System and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變監測系統及其方法)	Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Apparatus and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變之估測裝置及其方法)	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統)	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置)	Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:50:34Z	Method and Apparatus for Designing Patterning System Based on Patterning Fidelity	Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints	Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI

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