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| 國立交通大學 |
2020-02-02T23:54:28Z |
A characteristic improved technique and analysis with plasma treatment to the electrode on oxide-based resistive random access memory
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Lin, Chih-Yang; Chang, Ting-Chang; Pan, Chih-Hung; Chen, Min-Chen; Xu, You-Lin; Tan, Yung-Fang; Wu, Pei-Yu; Chen, Chun-Kuei; Huang, Wei-Chen; Lin, Yun-Hsuan; Chao, Yu-Ting; Shou, Cheng-Yun; Ma, Xiao-Hua; Hao, Yue; Sze, Simon M. |
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