English  |  正體中文  |  简体中文  |  2817692  
???header.visitor??? :  27819841    ???header.onlineuser??? :  453
???header.sponsordeclaration???
 
臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
???ui.leftmenu.abouttair???

???ui.leftmenu.bartitle???

???index.news???

???ui.leftmenu.copyrighttitle???

???ui.leftmenu.link???

"shvu sh"???jsp.browse.items-by-author.description???

???jsp.browse.items-by-author.back???
???jsp.browse.items-by-author.order1??? ???jsp.browse.items-by-author.order2???

Showing items 1-2 of 2  (1 Page(s) Totally)
1 
View [10|25|50] records per page

Institution Date Title Author
國立交通大學 2014-12-08T15:48:54Z Controlling the diffusion of implanted boron in Si and silicide by multiple implants Chu, CH; Ho, KJ; Huang, CT; Shvu, SH; Lei, TF
國立交通大學 2014-12-08T15:02:47Z The influence of Ge-implantation on the electrical characteristics of the ultra-shallow junction formed by using silicide as a diffusion source Huang, CT; Lei, TF; Chu, CH; Shvu, SH

Showing items 1-2 of 2  (1 Page(s) Totally)
1 
View [10|25|50] records per page