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Institution Date Title Author
國立交通大學 2014-12-08T15:48:54Z Controlling the diffusion of implanted boron in Si and silicide by multiple implants Chu, CH; Ho, KJ; Huang, CT; Shvu, SH; Lei, TF
國立交通大學 2014-12-08T15:02:47Z The influence of Ge-implantation on the electrical characteristics of the ultra-shallow junction formed by using silicide as a diffusion source Huang, CT; Lei, TF; Chu, CH; Shvu, SH

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