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Showing items 1-5 of 5 (1 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:27:54Z |
SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIM
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LOONG, WA; SHY, SL; GUO, GC; CHOU, YL |
| 國立交通大學 |
2014-12-08T15:27:43Z |
SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM
|
LOONG, WA; YEH, CH; SHY, SL |
| 國立交通大學 |
2014-12-08T15:04:14Z |
CROSS SHAPED PATTERN ON CHROME MASK FOR 0.5 MU-M CONTACT HOLE FABRICATION
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LOONG, WA; SHY, SL; GUO, GC; YANG, MT; SU, SY |
| 國立交通大學 |
2014-12-08T15:03:33Z |
0.35-MU-M PATTERN FABRICATION USING QUARTZ-ETCH ATTENUATE PHASE-SHIFTING MASK IN AN I-LINE STEPPER WITH A 0.50-NA AND A 0.60-SIGMA
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LOONG, WA; SHY, SL; LIN, YC |
| 國立交通大學 |
2014-12-08T15:02:13Z |
A simple fabrication process of T-shaped gates using a deep-UV/electron-beam/deep-UV tri-layer resist system and electron-beam lithography
|
Lai, YL; Chang, EY; Chang, CY; Yang, HPD; Nakamura, K; Shy, SL |
Showing items 1-5 of 5 (1 Page(s) Totally)
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