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Institution Date Title Author
國立成功大學 2004-07 Effect of halogen in high-density oxygen plasmas on photoresist trimming Sin, Chian-Yuh; Chen, Bing-Hung; Loh, W. L.; Yu, J.; Yelehanka, P.; See, A.; Chan, L.
國立成功大學 2003-11-26 Photoresist trimming in oxygen-based high-density plasmas: Effect of HBr and Cl-2 addition to CF4/O-2 mixtures Sin, Chian-Yuh; Chen, Bing-Hung; Loh, W. L.; Yu, J.; Yelehanka, P.; See, A.; Chan, L.
國立成功大學 2003-05 Resist trimming technique in CF4/O-2 high-density plasmas for sub-0.1 mu m MOSFET fabrication using 248-nm lithography Sin, Chian-Yuh; Chen, Bing-Hung; Loh, W. L.; Yu, J.; Yelehanka, P.; Chan, L.

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