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Institution Date Title Author
臺大學術典藏 2019-12-27T07:50:08Z Influence of in situ applied stress during thermal oxidation of (111)Si on P-b interface defects Stesmans, A.;Pierreux, D.;Jaccodine, R. J.;Lin, M. T.;Delph, T. J.; Stesmans, A.; Pierreux, D.; Jaccodine, R. J.; Lin, M. T.; Delph, T. J.; MINN-TSONG LIN
臺大學術典藏 2019-12-27T07:50:08Z Influence of in situ applied stress during thermal oxidation of (111)Si on P-b interface defects Stesmans, A.;Pierreux, D.;Jaccodine, R. J.;Lin, M. T.;Delph, T. J.; Stesmans, A.; Pierreux, D.; Jaccodine, R. J.; Lin, M. T.; Delph, T. J.; MINN-TSONG LIN
臺大學術典藏 2019-12-27T07:50:07Z Electron spin resonance study of the effect of applied stress during thermal oxidation of (111)Si on inherent Pb interface defects Pierreux, D.;Stesmans, A.;Jaccodine, R. J.;Lin, M. T.;Delph, T. J.; Pierreux, D.; Stesmans, A.; Jaccodine, R. J.; Lin, M. T.; Delph, T. J.; MINN-TSONG LIN
臺大學術典藏 2019-12-27T07:50:07Z Electron spin resonance study of the effect of applied stress during thermal oxidation of (111)Si on inherent Pb interface defects Pierreux, D.;Stesmans, A.;Jaccodine, R. J.;Lin, M. T.;Delph, T. J.; Pierreux, D.; Stesmans, A.; Jaccodine, R. J.; Lin, M. T.; Delph, T. J.; MINN-TSONG LIN

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