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Showing items 6-15 of 47  (5 Page(s) Totally)
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Institution Date Title Author
臺大學術典藏 2018-09-10T09:48:17Z Implant isolation of silicon two-dimensional electron gases at 4.2 K Huang, C.-T.;Li, J.-Y.;Sturm, J.C.; Huang, C.-T.; Li, J.-Y.; Sturm, J.C.; JIUN-YUN LI
臺大學術典藏 2018-09-10T09:48:16Z The effect of germanium fraction on high-field band-to-band tunneling in p+-SiGe/n+-SiGe junctions in forward and reverse biases Li, J.-Y.;Sturm, J.C.; Li, J.-Y.; Sturm, J.C.; JIUN-YUN LI
臺大學術典藏 2018-09-10T09:48:16Z Very low electron density in undoped enhancement-mode Si/SiGe two-dimensional electron gases with thin sige cap layers JIUN-YUN LI; Sturm, J.C.; Li, J.-Y.; Huang, C.-T.; Huang, C.-T.;Li, J.-Y.;Sturm, J.C.
臺大學術典藏 2018-09-10T09:22:35Z The effect of hydrogen on the surface segregation of phosphorus in epitaxially grown relaxed Si 0.7Ge 0.3 films by rapid thermal chemical vapor deposition Li, J.-Y.; Huang, C.-T.; Sturm, J.C.; JIUN-YUN LI
臺大學術典藏 2018-09-10T09:22:35Z High breakdown voltage schottky gating of doped Si/SiGe 2DEG systems enabled by suppression of phosphorus surface segregation Huang, C.-T.; Li, J.-Y.; Sturm, J.C.; JIUN-YUN LI
臺大學術典藏 2018-09-10T09:22:35Z Extremely sharp phosphorus turn-off slope and effect of hydrogen on phosphorus surface segregation in epitaxially-grown relaxed Si0.7Ge0.3 by RTCVD Li, J.-Y.; Huang, C.-T.; Sturm, J.C.; JIUN-YUN LI
臺大學術典藏 2018-09-10T09:22:35Z Extremely low electron density in a modulation-doped Si/SiGe two-dimensional electron gases by effective schottky gating Li, J.Y.; Huang, C.T.; Rokhinson, L.P.; Sturm, J.C.; JIUN-YUN LI
臺大學術典藏 2018-09-10T07:37:20Z Thermal stability of Si/Si1-x-yGexCy/Si quantum wells grown by rapid thermal chemical vapor deposition Liu, C.W.; Tseng, Y.D.; Chern, M.Y.; Chang, C.L.; Sturm, J.C.; CHEE-WEE LIU
臺大學術典藏 2018-09-10T07:37:20Z Bandgap dependence of band-to-band tunneling and defect-mediated excess currents in SiGe/Si heterojunction tunnel diodes grown by RTCVD Li, J.-Y.;Sturm, J.C.; Li, J.-Y.; Sturm, J.C.; JIUN-YUN LI
臺大學術典藏 2018-09-10T07:29:05Z Thermal stability of Si/Si1-x-yGexCy/Si quantum wells grown by rapid thermal chemical vapor deposition Liu, C.W.; Tseng, Y.D.; Chern, M.Y.; Chang, C.L.; Sturm, J.C.; MING-YAU CHERN

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