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Showing items 21-34 of 34  (1 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:27:43Z Characterization and optimization of NO-nitrided gate oxide by RTP Sun, SC; Chen, CH; Yen, DLW; Lin, CJ
國立交通大學 2014-12-08T15:27:23Z Evaluation of PTFE nanoemulsion as a low dielectric constant material ILD Sun, SC; Chiang, YC; Rosenmayer, CT; Teguh, J; Wu, H
國立交通大學 2014-12-08T15:04:20Z CHARACTERIZATIONS OF OXIDE GROWN BY N2O CHAO, TS; CHEN, WH; SUN, SC; CHANG, HY
國立交通大學 2014-12-08T15:03:39Z COMPARISON OF CHEMICAL-VAPOR-DEPOSITION OF TIN USING TETRAKIS-DIETHYLAMINO-TITANIUM AND TETRAKIS-DIMETHYLAMINO-TITANIUM SUN, SC; TSAI, MH
國立交通大學 2014-12-08T15:03:13Z METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF TANTALUM NITRIDE BY TERTBUTYLIMIDOTRIS(DIETHYLAMIDO)TANTALUM FOR ADVANCED METALLIZATION TSAI, MH; SUN, SC; CHIU, HT; TSAI, CE; CHUANG, SH
國立交通大學 2014-12-08T15:03:02Z Metal-organic chemical vapor deposition of tantalum nitride barrier layers for ULSI applications Tsai, MH; Sun, SC; Lee, CP; Chiu, HT; Tsai, CE; Chuang, SH; Wu, SC
國立交通大學 2014-12-08T15:02:53Z Effect of rapid thermal annealing on the electrical and physical properties of metalorganic chemical-vapor-deposited TiN Sun, SC; Tsai, MH
國立交通大學 2014-12-08T15:02:46Z Metalorganic chemical vapor deposition of tungsten nitride for advanced metallization Tsai, MH; Sun, SC; Chiu, HT; Chuang, SH
國立交通大學 2014-12-08T15:02:39Z Comparison of the diffusion barrier properties of chemical-vapor-deposited TaN and sputtered TaN between Cu and Si Tsai, MH; Sun, SC; Tsai, CE; Chuang, SH; Chiu, HT
國立交通大學 2014-12-08T15:02:33Z Leakage current reduction in chemical-vapor-deposited Ta2O5 films by rapid thermal annealing in N2O Sun, SC; Chen, TF
國立交通大學 2014-12-08T15:01:56Z Effects of electrode materials and annealing ambients on the electrical properties of TiO2 thin films by metalorganic chemical vapor deposition Sun, SC; Chen, TF
國立交通大學 2014-12-08T15:01:43Z Reduction of leakage current in chemical-vapor-deposited Ta2O5 thin films by furnace N2O annealing Sun, SC; Chen, TF
國立交通大學 2014-12-08T15:01:24Z Effect of oxygen to argon ratio on properties of (Ba,Sr)TiO3 thin films prepared by radio-frequency magnetron sputtering Tsai, MS; Sun, SC; Tseng, TY
國立交通大學 2014-12-08T15:01:10Z Electrical properties of O-2 and N-2 annealed (Ba,Sr)TiO3 thin films Tsai, MS; Sun, SC; Tseng, TY

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