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"sun sc"的相关文件
显示项目 11-20 / 34 (共4页)
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| 國立交通大學 |
2014-12-08T15:27:53Z |
RAPID THERMAL-OXIDATION OF LIGHTLY DOPED SILICON IN N2O
|
SUN, SC; WANG, LS; YEH, FL; LAI, TS; LIN, YH |
| 國立交通大學 |
2014-12-08T15:27:51Z |
A NOVEL APPROACH FOR LEAKAGE CURRENT REDUCTION OF LPCVD TA(2)O(5) AND TIO(2) FILMS BY RAPID THERMAL N(2)O ANNEALING
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SUN, SC; CHEN, TF |
| 國立交通大學 |
2014-12-08T15:27:49Z |
CHARACTERIZATION OF CHEMICAL-MECHANICAL POLISHING DIELECTRICS FOR MULTILEVEL METALLIZATION
|
SUN, SC; YEH, FL; TIEN, HZ |
| 國立交通大學 |
2014-12-08T15:27:48Z |
Performance of MOCVD tantalum nitride diffusion barrier for copper metallization
|
Sun, SC; Tsai, MH; Tsai, CE; Chiu, HT |
| 國立交通大學 |
2014-12-08T15:27:48Z |
Rapid thermal chemical vapor deposition of in-situ nitrogen-doped polysilicon for dual gate CMOS
|
Sun, SC; Wang, LS; Yeh, FL; Chen, CH |
| 國立交通大學 |
2014-12-08T15:27:45Z |
Gate oxynitride grown in N2O and annealed in no using rapid thermal processing
|
Sun, SC; Chen, CH; Lou, JC; Yen, LW; Lin, CJ |
| 國立交通大學 |
2014-12-08T15:27:45Z |
Rapid thermal chemical vapor deposition of nitrogen-doped polysilicon for high-performance and high-reliability CMOS technology
|
Sun, SC; Wang, LS; Yeh, FL |
| 國立交通大學 |
2014-12-08T15:27:44Z |
MOS characteristics of N2O-grown and NO-annealed oxynitrides
|
Sun, SC; Chen, CH; Lou, JC |
| 國立交通大學 |
2014-12-08T15:27:44Z |
Properties of metalorganic chemical vapor deposited tantalum nitride thin films
|
Sun, SC; Tsai, MH; Tsai, CE; Chiu, HT |
| 國立交通大學 |
2014-12-08T15:27:43Z |
A comparative study of CVD TiN and CVD TaN diffusion barriers for copper interconnection
|
Sun, SC; Tsai, MH; Chiu, HT; Chuang, SH; Tsai, CE |
显示项目 11-20 / 34 (共4页)
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