臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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	Repositories
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	2019臺灣學術機構典藏研討會
	機構典藏系統RC7版本已發佈

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	臺大學術典藏NTU Scholars

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Institution	Date	Title	Author
中原大學	2005	Membrane Separation Systems for Waste Solvent Recovery from High-tech Industries	Lai, J. Y.;S. C. Chen;R. C. Ruaan;C. J. Chuang;K. R. Lee;T. C. Wei;J. Chen;K. L. Tung;Y. L. Liu;Y. M. Sun;D. M. Wang
中原大學	2004-7	Diagnostics of CH2F2/CF4 plasma in Fluorocarbon Film Deposition	T. C. Wei;C. H. Liu;
中原大學	2004-12	Kinetic Modeling of Ozone Generation via Dielectric Barrier Discharges	H. M. Lee;M. B. Chang;T. C. Wei
中原大學	2003	Membrane Separation Systems for Waste Solvent Recovery from High-tech Industries	Lai, J. Y.;S. C. Chen;R. C. Ruaan;C. J. Chuang;K. R. Lee;T. C. Wei;J. Chen;K. L. Tung;Y. L. Liu;Y. M. Sun;D. M. Wang
中原大學	2003	Design, Preparation and Application of High Performance Membranes	Lai, J. Y.;S. C. Chen;C. J. Chuang;R. C. Ruaan;T. C. Wei;K. L. Tung;Y. L. Liu
中原大學	2002-5	Abatement of CF4, C2F6, and CHF3 in Microwave Generated Surface Wave Plasmas.	T. C. Wei;Y. S. Fang;
中原大學	2002	A Comparative Study of Ammonia/Hydrocarbon and Nitrogen/Hydrocarbon Plasma Polymer for Oxygen/Nitrogen Separation	T. C. Wei;S. W. Yang;
中原大學	2002	Design, Preparation and Application of High Performance Membranes	Lai, J. Y.;S. C. Chen;C. J. Chuang;R. C. Ruaan;T. C. Wei;K. L. Tung;Y. L. Liu
中原大學	2001-8	A New Atmospheric-Pressure PFC Abatement Process: Combined Plasma Catalysis	H. W. Lee;M. B. Chang;S. J. Yu;T. C. Wei;
中原大學	2001-7	Removal of Gaseous Volatile Organic Compounds via Dielectric Barrier Discharge	H. W. Lee;M. B. Chang;T. C. Wei;
中原大學	2001-4	Modeling Study on Plasma Reforming of Greenhouse Gases in a Silent Discharge	T. C. Wei;H. F. Huang;C. C. Wu;
中原大學	2001-11	Two-dimensional Continuum Model of Inductively Coupled Ar/Cl2/BCl3 Plasmas with Comparisons to Experiments	T. C. Wei;C. C. Yang;
中原大學	2001	Oxygen/Nitrogen Separation of TPX Membranes Modified by Acetylene/Nitrogen Plasmas	T.-C. Wei;C.Y. Shih;R.C. Ruaan;J.Y. Lai;
中原大學	2000	Etching Characteristics of Organic Low-k Dielectrics in the Helicon-wave Plasma Etcher for 0.15 μm Damascene Architecture.	J.M. Shieh;T.C. Wei;C.H. Liu;S.C. Suen;B.T. Dai
中原大學	2000	The Study on Thermal Stability of Fluorinated Amorphous Carbon Film (a-C:F) Deposited by PECVD.	S.C. Suen;J.M. Shieh;M.S. Tsai;B.T. Dai;C.H. Liu;T.C. Wei;
中原大學	2000	Direct Conversion of Methane in Microwave Plasmas.	T.C. Wei;S.F. Huang;C.B. Lee;
中原大學	1999	Sidenall-Fence-Free Pt Etching with Ar/O2 Mixed Gas Plasma	T.C.Wei;M.C.Chiang;F.M.Pan;H.C.CHIEN;J.Sliu;H.K.Chiu;
中原大學	1999	Reactive Ion Etching of Ir Films with a TiN Mask in Ar/O2/BCl3 Helicon Wave Plasma	T.C.Wei;M.C.Chiang;F.M.Pan;T.P.Liu;B.T.Dai;H.C.Chien;

Showing items 21-38 of 38 (2 Page(s) Totally)
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