English  |  正體中文  |  简体中文  |  2828323  
???header.visitor??? :  32242332    ???header.onlineuser??? :  4155
???header.sponsordeclaration???
 		 
???search.scope??? ???search.advance???
臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
???ui.leftmenu.abouttair???
???ui.leftmenu.explanation???

???ui.leftmenu.bartitle???
Repositories
Author
Title
Date
???ui.leftmenu.statisticschart???
???ui.leftmenu.realtimefacts???
???ui.leftmenu.trend???

???index.news???
2019臺灣學術機構典藏
研討會
機構典藏系統RC7版本已
發佈

???ui.leftmenu.copyrighttitle???
???ui.leftmenu.copyrightpublisher???
???ui.leftmenu.copyrightconference???

???ui.leftmenu.link???
機構典藏計畫網站
ROAR
OpenDOAR
SHERPA
OAIster
JAIRO
Ira
DSPACE
RWWR
臺大學術典藏NTU Scholars
???tair.name??? >  ???browser.page.title.author???

"t c wei"???jsp.browse.items-by-author.description???

???jsp.browse.items-by-author.back???
???jsp.browse.items-by-author.order1??? ???jsp.browse.items-by-author.order2???

Showing items 26-38 of 38  (2 Page(s) Totally)
<< < 1 2 
View [10|25|50] records per page

Institution Date Title Author
中原大學 2002-5 Abatement of CF4, C2F6, and CHF3 in Microwave Generated Surface Wave Plasmas. T. C. Wei;Y. S. Fang;
中原大學 2002 A Comparative Study of Ammonia/Hydrocarbon and Nitrogen/Hydrocarbon Plasma Polymer for Oxygen/Nitrogen Separation T. C. Wei;S. W. Yang;
中原大學 2002 Design, Preparation and Application of High Performance Membranes Lai, J. Y.;S. C. Chen;C. J. Chuang;R. C. Ruaan;T. C. Wei;K. L. Tung;Y. L. Liu
中原大學 2001-8 A New Atmospheric-Pressure PFC Abatement Process: Combined Plasma Catalysis H. W. Lee;M. B. Chang;S. J. Yu;T. C. Wei;
中原大學 2001-7 Removal of Gaseous Volatile Organic Compounds via Dielectric Barrier Discharge H. W. Lee;M. B. Chang;T. C. Wei;
中原大學 2001-4 Modeling Study on Plasma Reforming of Greenhouse Gases in a Silent Discharge T. C. Wei;H. F. Huang;C. C. Wu;
中原大學 2001-11 Two-dimensional Continuum Model of Inductively Coupled Ar/Cl2/BCl3 Plasmas with Comparisons to Experiments T. C. Wei;C. C. Yang;
中原大學 2001 Oxygen/Nitrogen Separation of TPX Membranes Modified by Acetylene/Nitrogen Plasmas T.-C. Wei;C.Y. Shih;R.C. Ruaan;J.Y. Lai;
中原大學 2000 Etching Characteristics of Organic Low-k Dielectrics in the Helicon-wave Plasma Etcher for 0.15 μm Damascene Architecture. J.M. Shieh;T.C. Wei;C.H. Liu;S.C. Suen;B.T. Dai
中原大學 2000 The Study on Thermal Stability of Fluorinated Amorphous Carbon Film (a-C:F) Deposited by PECVD. S.C. Suen;J.M. Shieh;M.S. Tsai;B.T. Dai;C.H. Liu;T.C. Wei;
中原大學 2000 Direct Conversion of Methane in Microwave Plasmas. T.C. Wei;S.F. Huang;C.B. Lee;
中原大學 1999 Sidenall-Fence-Free Pt Etching with Ar/O2 Mixed Gas Plasma T.C.Wei;M.C.Chiang;F.M.Pan;H.C.CHIEN;J.Sliu;H.K.Chiu;
中原大學 1999 Reactive Ion Etching of Ir Films with a TiN Mask in Ar/O2/BCl3 Helicon Wave Plasma T.C.Wei;M.C.Chiang;F.M.Pan;T.P.Liu;B.T.Dai;H.C.Chien;

Showing items 26-38 of 38  (2 Page(s) Totally)
<< < 1 2 
View [10|25|50] records per page

DSpace Software Copyright © 2002-2004  MIT   &  Hewlett-Packard   /   Enhanced by   NTU Library IR team