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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
國立中山大學 2007-09-01 Spinal somatosensory evoked potential to evaluate neurophysiologic changes associated with postlaminotomy fibrosis: an experimental study. I.M. Jou; T.W. Tai; C.L. Tsai; T.M. Tsai; W.S. Yung; Y.C. Jung
國立中山大學 2007-04-20 Neurophysiologic changes after pre- and postganglionic nerve- root constriction: an experimental study in the rat. H. Matsuda;C.L. Tsai;Y.T. Tseng;A. Noriage; T.M. Tsai;Y.C. Dai;I.M. Jou
國立中山大學 2005 Value of dermatomal somatosensory evoked potentials in detecting acute nerve root injury:an experimental study with special emphasis on stimulus intensity T.M. Tsai;C.L. Tsai;T.S. Lin;C.C. Lin;I.M. Jou
國立中山大學 2005 Leakage conduction behavior in electron-beam-cured nanoporous silicate films P.T. Liu;T.M. Tsai;T.C. Chang
國立中山大學 2004 Method to improve chemical-mechanical-planarization polishing rate of low-k methyl-silsesquiazane for ultralarge scale integrated interconnect application T.C. Chang;T.M. Tsai;P.T. Liu;S.T. Yan;Y.C. Chang;H. Aoki;S.M. Sze;T.Y. Tseng
國立中山大學 2004 Study on the effect of electron beam curing on low-K porous organosilicate glass (OSG) material T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;T.Y. Tseng
國立中山大學 2004 CMP of Ultra Low-k Material Porous-Polysilazane (PPSZ) for Interconnect Applications T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;Y.C. Chang;T.Y. Tseng
國立中山大學 2004 CMP of low-k methylsilsesquiazane with oxygen plasma treatment for multilevel interconnect applications T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;Y.C. Chang;T.Y. Tseng
國立中山大學 2004 CMP of ultra low-k material porous-polysilazane (PPSZ) for interconnect applications T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;T.Y. Tseng
國立中山大學 2004 CMP of ultra low-k Methylsilsesquiazane with oxygen plasma treatment for multilevel interconnect applications T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;T.Y. Tseng
國立中山大學 2004 Method to improve chemical-mechanical-planarization polishing rate of low-k methyl-silsesquiazane for ultralarge scale integraged interconnect application T.C. Chang;T.M. Tsai;P.T. Liu;Y.C. Chang;J. Aoki;S.M. Sze;T.Y. Tseng
國立中山大學 2004 Cu-penetration induced breakdown mechanism for a-SiCN C.W. Chen;P.T. Liu;T.C. Chang;J.H. Yang;T.M. Tsai;H.H. Wu;T.Y. Tseng
國立中山大學 2004 Investigation of the electrical properties and reliability of amorphous SiCN C.W. Chen;T.C. Chang;P.T. Liu;T.M. Tsai;C.H. Huang;J.M. Chen;T.Y. Tseng
國立中山大學 2004 Study on the effect of electron beam curing on low-K porous organosilicate glass (OSG) material T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;T.Y. Tseng
國立中山大學 2003 Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-ray Exposure Technology T.C. Chang;T.M. Tsai;P.T. Liu;Y.S. Mor;C.W. Chen;J.T. Sheu;T.Y. Tseng
國立中山大學 2003 Moisture-induced material instability of porous organosilicate glass T.C. Chang;C.W. Chen;P.T. Liu;Y.S. Mor;H.M. Tsai;T.M. Tsai;S.T. Yan;C.H. Tu;T.Y. Tsing;S.M. Sze

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