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Institution Date Title Author
國立成功大學 2019-01 Effect of annealing conditions on dopants activation and stress conservation in silicon-germanium Kuo;Tai-Chen;Jhong;Kai-Jyun;Lin;Chia-Wei;Lee;Wen-Hsi
國立成功大學 2017-07-3 Effect of microwave annealing on electrical characteristics of TiN/Al/TiN/HfO2/Si MOS capacitors Shih;Tzu-Lang;Su;Yin-Hsien;Kuo;Tai-Chen;Lee;Wen-Hsi;Current;Ira, Michael
國立成功大學 2017-03-5 Effect of tungsten incorporation in cobalt tungsten alloys as seedless diffusion barrier materials Su;Yin-Hsien;Kuo;Tai-Chen;Lee;Wen-Hsi;Wang;Yu-Sheng;Hung;Chi-Cheng;Tseng;Wei-Hsiang;Wei;Kuo-Hsiu;Wang;Ying-Lang

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