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Institution	Date	Title	Author
中國文化大學	2007	Challenges and performance limitations of high-k and oxynitride gate dielectrics for 90/65 nm CMOS technology	Tan, S. Y.
中國文化大學	2007	A thermally robust Ni-FUSI process using in 65 nm CMOS technology	Tan, S. Y.;Sung, C. L.;Wu, W. F.

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