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Showing items 1-12 of 12  (1 Page(s) Totally)
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Institution Date Title Author
臺大學術典藏 2018-09-10T08:18:22Z Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography Sheng-Yung Chen;Kuen-Yu Tsai;Hoi-Tou Ng;Chi-Hsiung Fan;Ting-Han Pei;Chieh-Hsiung Kuan;Yung-Yaw Chen;Yi-Hung Kuo;Cheng-Ju Wu;Jia-Yush Yen; Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:22Z Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography Sheng-Yung Chen;Kuen-Yu Tsai;Hoi-Tou Ng;Chi-Hsiung Fan;Ting-Han Pei;Chieh-Hsiung Kuan;Yung-Yaw Chen;Yi-Hung Kuo;Cheng-Ju Wu;Jia-Yush Yen; Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:20Z Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li
臺大學術典藏 2018-09-10T08:18:20Z Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li
臺大學術典藏 2018-09-10T07:42:07Z Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI

Showing items 1-12 of 12  (1 Page(s) Totally)
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